| Product ID | Formula | Purity | Dimension | Quantity | Price in € | Inquiry |
|---|---|---|---|---|---|---|
| 4900ST001 | In | 99.99% | Ø 25.4 mm x 3.175 mm | 1 | 112.00 | Inquire |
| 4900ST002 | In | 99.99% | Ø 25.4 mm x 6.35 mm | 1 | 127.00 | Inquire |
| 4900ST003 | In | 99.99% | Ø 50.8 mm x 3.175 mm | 1 | 348.00 | Inquire |
| 4900ST004 | In | 99.99% | Ø 50.8 mm x 6.35 mm | 1 | 359.00 | Inquire |
| 4900ST005 | In | 99.99% | Ø 76.2 mm x 3.175 mm | 1 | 592.00 | Inquire |
| 4900ST006 | In | 99.99% | Ø 76.2 mm x 6.35 mm | 1 | 608.00 | Inquire |
| 4900ST007 | In | 99.99% | 100 mm x 100 mm x 3 mm | 1 | POR | Inquire |
Indium sputtering targets are mainly composed of metallic indium, which has a very high purity and is usually used to manufacture key components in various electronic devices.
VIMATERIAL specializes in the production of indium foils/sheets, indium wires, indium beads, indium strips, indium targets, indium powder, and other indium products. We support processing with customer-supplied materials and maintain a stock of products available year-round. Contact us for more information.
Molecular formula: In
Molar mass: 114.8g/mol
Appearance: Silvery white
Density: 7.31g/cm3 at25°C
Melting point: 156.6°C
Boiling point: 2080°C
Coefficient of Thermal Expansion (CTE): (25C) 32.1um·m-1.K-1
Thermal Conductivity: 0.818W/cm/K at 298.2 K
Resistivity: 8.37Ω·m at 20°C
Electronics and Semiconductor Field: Indium and its compounds, such as InGaAs, are used to manufacture electronic semiconductor devices, with electron transport speeds several times faster than silicon. Indium sputtering targets are also used in the production of devices like Metal-Oxide-Semiconductor Field-Effect Transistors (MOSFETs), Metal-Semiconductor Field-Effect Transistors (MESFETs), and High Electron Mobility Transistors (HEMTs).
Optoelectronics and LCDs: Indium is used to produce ITO targets for liquid crystal displays (LCDs) and flat panel screens, which is the primary area of global indium consumption. Indium tin alloy targets are used in DC reactive sputtering to create ITO thin films, which are employed in transparent conductive coatings for electronic devices like flat-panel displays and touchscreens.
Low-Melting Alloys and Bearing Alloys: Indium’s low melting point makes it an important component in low-melting alloys, which are commonly used in low-temperature soldering, temperature sensors, and thermistors. Indium sputtering target is also used in the production of bearing alloys.
Magnetic and Optical Materials: Indium target is used in the production of magnetic materials, such as the TbFeCo alloy targets required for magnetic optical discs. Additionally, indium has applications in optical materials, where it is used to make optical lenses and windows for infrared optical systems and lasers.
Our products implement the most stringent quality management system. There are strict inspection standards for incoming materials, processes, final inspections, and factory inspections. Strict isolation measures will be adopted for unqualified processing to prevent unqualified products from flowing into the next process. Samples will be provided to customers according to customer requirements for re-inspection.
Vacuum packaging, the packaging quantity can be provided according to customer requirements and packaged separately.
Indium sputtering targets should be sealed and stored in a cool and dry environment to prevent it from reacting with moisture and oxygen in the air.
Q1: What is indium sputtering target used for？
A: Indium targets are used in electronics and semiconductors (e.g., MOSFETs, HEMTs), optoelectronics and LCDs for ITO thin films, low-melting and bearing alloys, as well as magnetic and optical materials such as magnetic discs and infrared lenses.
Q2: What Is indium target bonding?
A: Indium sputtering refers to the process of using indium (In) or its alloys as solder in physical vapor deposition (PVD) and other processes to firmly bond the sputtering target to a backing plate (usually a metal such as copper or molybdenum). This technology is mainly used to improve the thermal conductivity, mechanical stability, and service life of the sputtering target, and is especially suitable for brittle, expensive, or high-power sputtering targets.
Q3: Can indium sputtering target be customized?
A: Yes, Indium sputtering targets can be fully customized to meet specific application requirements. We offer tailored solutions in terms of purity levels, dimensions, and shapes to suit different deposition processes and equipment. Whether you need standard discs, rectangular targets, or special geometries, our team can manufacture according to your technical drawings and specifications. This ensures optimal performance, compatibility, and efficiency for your particular application.
Q4: What is the production lead time?
A:In Stock: Immediate shipping
Standard Products: Generally 2-4 Weeks
Customized Products: Determined based on required details
Special requirements can be discussed
VI HALBLEITERMATERIAL GmbH (VIMATERIAL) employs a stringent quality assurance system to ensure the reliability of our product quality. Strict quality control is implemented throughout the entire production chain, and for defective products, we strictly enforce the principle of rework and redo. Each batch is released only after passing detailed specification tests.
Every batch of our materials is independently tested, and, if necessary, we send samples to certified companies for testing. We provide these documents and analysis certificates with the shipment to certify that our products meet the required standards.
Contact our team of experts today and let us help you with your business!
