Catalogries

Chemical Name:
Titanium metal
Formula:
Ti
Product No.:
2200
CAS No.:
7440-32-6
EINECS No.:
231-142-3
Form:
Sputtering Target
HazMat:
Product ID Formula Purity Dimension Quantity Price in € Inquiry
2200ST001 Ti 99.5% Ø 63mm x 32mm 1 POR Inquire
2200ST002 Ti 99.5% Ø 100mm x 40mm 1 POR Inquire
2200ST003 Ti 99.99% Ø 50.8mm x 3.175mm 1 POR Inquire
2200ST004 Ti 99.99% Ø 76.2mm x 3.175mm 1 POR Inquire
2200ST005 Ti 99.999% Ø 50.8mm x 6.35mm 1 461.00 Inquire
2200ST006 Ti 99.999% Ø 76.2mm x 3.175mm 1 367.00 Inquire
2200ST007 Ti 99.999% Ø 76.2mm x 6.35mm 1 467.00 Inquire
2200ST008 Ti 99.999% Ø 101.6mm x 6.35mm 1 594.00 Inquire
2200ST009 Ti 99.999% Ø 203.2mm x 6.35mm 1 POR Inquire
Product ID
2200ST001
Formula
Ti
Purity
99.5%
Dimension
Ø 63mm x 32mm
Quantity
1
Price in €
POR
Product ID
2200ST002
Formula
Ti
Purity
99.5%
Dimension
Ø 100mm x 40mm
Quantity
1
Price in €
POR
Product ID
2200ST003
Formula
Ti
Purity
99.99%
Dimension
Ø 50.8mm x 3.175mm
Quantity
1
Price in €
POR
Product ID
2200ST004
Formula
Ti
Purity
99.99%
Dimension
Ø 76.2mm x 3.175mm
Quantity
1
Price in €
POR
Product ID
2200ST005
Formula
Ti
Purity
99.999%
Dimension
Ø 50.8mm x 6.35mm
Quantity
1
Price in €
461.00
Product ID
2200ST006
Formula
Ti
Purity
99.999%
Dimension
Ø 76.2mm x 3.175mm
Quantity
1
Price in €
367.00
Product ID
2200ST007
Formula
Ti
Purity
99.999%
Dimension
Ø 76.2mm x 6.35mm
Quantity
1
Price in €
467.00
Product ID
2200ST008
Formula
Ti
Purity
99.999%
Dimension
Ø 101.6mm x 6.35mm
Quantity
1
Price in €
594.00
Product ID
2200ST009
Formula
Ti
Purity
99.999%
Dimension
Ø 203.2mm x 6.35mm
Quantity
1
Price in €
POR

Titanium sputtering targets are high-purity metallic targets widely used for Physical Vapor Deposition (PVD) thin-film coating processes. Titanium exhibits excellent corrosion resistance, strong adhesion, high mechanical strength, and outstanding chemical stability, making it an ideal material for semiconductor, optical coating, decorative coating, and advanced industrial applications.

VIMATERIAL supplies high-purity titanium sputtering targets with purity up to 99.999% (5N). Our targets are manufactured through vacuum melting, precision machining, and strict quality inspection to ensure excellent density, uniform microstructure, low impurity content, and stable sputtering performance. Contact us for more information.

Properties

Property Value
Chemical formula Ti
Atomic Number 22
Molecular Weight 47.867 g/mol
Appearance Silvery-white metallic
Purity 99.5%–99.999%
Density 4.506 g/cm³
Melting Point 1660°C
Boiling Point 3287°C
Crystal Structure Hexagonal Close-Packed (HCP)
Thermal Conductivity 21.9 W/m·K
Electrical Resistivity 42 nΩ·m

Key Features

  • High purity with extremely low impurity levels
  • Excellent sputtering stability and uniform erosion
  • High density for improved target utilization
  • Outstanding corrosion and oxidation resistance
  • Strong film adhesion with excellent surface finish
  • Suitable for DC magnetron sputtering and RF sputtering
  • Available in customized sizes and bonding configurations

Available Specifications

VIMATERIAL manufactures titanium sputtering targets in a wide variety of configurations.

Purity

  • 99.5%
  • 99.99%
  • 99.999%

Shape

  • Disc
  • Rectangle
  • Ring
  • Rotary Target
  • Custom Shape

Backing Plate

  • Copper Bonded
  • Stainless Steel Bonded
  • Indium Bonded
  • Unbonded

Custom dimensions and OEM specifications are available upon request.

Titanium Target Types

Pure Titanium Target

Pure titanium sputtering targets provide excellent corrosion resistance, stable sputtering behavior, and high film purity. They are widely used for semiconductor metallization, optical coatings, decorative coatings, and thin-film research.

Titanium Alloy Targets

Titanium alloy sputtering targets combine titanium with elements such as aluminum (TiAl), silicon (TiSi), tungsten (TiW), or nickel to achieve enhanced hardness, conductivity, oxidation resistance, or wear resistance for specialized thin-film applications.

Applications of Titanium sputtering target

Titanium sputtering targets are widely used for depositing high-performance thin films in semiconductor, optical, decorative, and industrial coating applications.

  • Semiconductor – Barrier layers, adhesion layers, interconnects, and MEMS devices.
  • Optical Coatings – Anti-reflective coatings, optical filters, camera lenses, and laser optics.
  • Decorative Coatings – Watches, jewelry, consumer electronics, and stainless steel decorative finishes.
  • Hard Coatings – TiN, TiCN, and TiO₂ thin films for cutting tools, molds, automotive parts, and wear-resistant components.
  • Data Storage – Thin films for hard disk drives and magnetic storage devices.

Quality Assurance

Every titanium sputtering target undergoes strict quality inspection before shipment to ensure consistent sputtering performance and reliable thin-film deposition.

Inspection items include:

  • ICP chemical analysis
  • Density testing
  • Grain size analysis
  • Surface roughness inspection
  • Ultrasonic flaw detection (when required)
  • Dimensional verification

Certificates of Analysis (COA) are available upon request.

Packaging & Storage

Titanium sputtering targets are vacuum-sealed and packaged with protective cushioning to prevent contamination and mechanical damage during transportation.

Store the product in a clean, dry, and well-ventilated environment. Avoid exposure to moisture, corrosive chemicals, and direct impacts before installation.

Why Choose VIMATERIAL?

  • Purity up to 99.999%
  • Precision machining with tight tolerances
  • Stable sputtering performance
  • Custom sizes and bonded targets available
  • Fast global delivery
  • Professional technical support
  • ISO quality management

Frequently Asked Questions

Q1. What purity of titanium sputtering targets do you offer?

Standard purities include 99.5%, 99.99%, and 99.999%. Higher purity grades can be customized upon request.

Q2. Can you manufacture custom dimensions?

Yes. We produce targets according to customer drawings or specifications, including diameter, thickness, shape, and backing plate requirements.

Q3. Which sputtering methods are suitable?

Titanium targets are compatible with DC magnetron sputtering, RF sputtering, and other PVD coating systems.

Q4. Are bonded titanium targets available?

Yes. We offer bonded and unbonded targets with copper, stainless steel, or customized backing plates.

Q5. What industries commonly use titanium sputtering targets?

Titanium sputtering targets are widely used in semiconductor manufacturing, optical coatings, decorative coatings, solar energy, hard coatings, data storage, and scientific research.

Recommended Product

QUALITY ASSURANCE

VI HALBLEITERMATERIAL GmbH (VIMATERIAL) employs a stringent quality assurance system to ensure the reliability of our product quality. Strict quality control is implemented throughout the entire production chain, and for defective products, we strictly enforce the principle of rework and redo. Each batch is released only after passing detailed specification tests.

Every batch of our materials is independently tested, and, if necessary, we send samples to certified companies for testing. We provide these documents and analysis certificates with the shipment to certify that our products meet the required standards.

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