How to make sputtering target?
Sputtering targets are materials used for thin film deposition. Sputtering technology is used to sputter material atoms or molecules from solid targets and then form
Our official blog with news, technology advice, and business culture.
Sputtering targets are materials used for thin film deposition. Sputtering technology is used to sputter material atoms or molecules from solid targets and then form
What is germanium metal? Germanium is a chemical element with the symbol Ge, atomic number 32, atomic weight 72.64, and is located in the 4th period and group IVA in the periodic table of chemical
The hydrothermal reactor is a small reactor commonly used in chemical laboratories. It is a closed container that can decompose insoluble substances. It can be used for sample pretreatment in atomic absorption spectroscopy and plasma
Tungsten is the metals with the highest melting point, which is 3422°C. It is mainly used to make filaments and high-speed cutting alloy steel, super-hard molds, and is also used in optical instruments and chemical
Boron nitride is a crystal composed of nitrogen and boron atoms, with the molecular formula BN, molecular weight 24.81, chemical composition 43.6% boron and 56.4% nitrogen, theoretical density 2.27g/cm3. Boron nitride powder has the properties
Niobium alloy C103 is a high-performance niobium-based alloy widely used in aerospace and high-temperature applications. It is primarily composed of niobium (Nb) with alloying elements like hafnium (Hf) and titanium (Ti), which enhance its mechanical
YSZ (ytria-stabilized Zirconia) is a ceramic material composed of zirconium dioxide (ZrO₂) stabilized by yttria (y₂O₃). By adding yttria, the phase transition temperature range of zirconium dioxide is changed to produce cubic and tetragonal crystals
Sputtering target is a physical vapor deposition technology. It is a process in which ions generated by an ion source are accelerated and gathered in a vacuum to form a high-speed ion beam, bombarding the
VI HALBLEITERMATERIAL GmbH offers a comprehensive range of high-purity, high-performance evaporation materials. These materials are instrumental in achieving the requisite coating properties. Our inventory includes a variety of shapes (such as granules, pellets, shots, tablets,
Sputtering targets are materials used for thin film deposition. Sputtering technology is used to sputter material atoms or molecules from solid targets and then form thin films on substrates. Sputtering targets are widely used in