Tungsten metal tube target is a hollow target made of high purity tungsten by hot isostatic pressing (HIP), plasma spraying, sintering or spinning processing, which is widely used in the thin film deposition process of flat panel displays, solar cells, photovoltaic glass, and touch panels. Its high melting point, high density and excellent electrical and thermal conductivity make it exhibit excellent structural stability and film uniformity under high-temperature vacuum environment.
The tungsten metal tube targets supplied by VIMATERIAL have high melting point and thermal stability, fast film output rate, uniform film layer, high recycling rate, high purity, low impurity, and strong corrosion resistance, contact us for technical support.
Chemical formula: W
Density: Theoretical density is 19.3 g/cm³.
Melting point: 3422°C
Resistivity: about 5.5 μΩ-cm
Crystal Structure Body Centered Cubic (BCC)
Dimensions: customized according to equipment
Flat Panel Display: Tungsten metal tube targets are widely used for thin film sputtering of metal electrodes in the production of TFT-LCDs and OLEDs to provide a stable conductive path. Its high purity and low particle rate ensure the display quality and panel yield.
Photovoltaic solar glass coating: In the low-e coating of photovoltaic glass, tungsten targets are used to deposit highly reflective or infrared reflective functional film layers. Their high uniformity helps to improve light transmission and cell conversion efficiency. 3.
Touch screen and ITO replacement material deposition: As a conductive thin film sputtering material, tungsten metalcan be co-sputtered with oxides to form a transparent conductive layer to replace ITO. As a conductive thin film sputtering material, tungsten can be co-sputtered with oxides to form transparent conductive layers instead of ITO. Tungsten targets have excellent adhesion and layer stability, and are suitable for flexible screens and other emerging display technologies.
Semiconductor and Microelectronics: As a high-performance metal interconnect material, tungsten metal can be used for gate and contact insertion layer deposition in BEOL (back-end-of-chip) processes. Tungsten targets are deposited by magnetron sputtering to form high-density metal films with low resistance and good thermal stability.
VIMATERIAL strictly implements a quality management system to ensure the consistency and high standard of our products during the whole process of R&D, production, shipment and service. All batches have to pass the standardized tests before leaving the factory and any deviation is handled in accordance with the 8D procedure. We fully comply with international standards such as REACH and ASTM, and are committed to the construction of a sustainable and socially responsible supply chain.
Tungsten metal tube targets are vacuum packed individually and placed in customized wooden boxes.
The tungsten metal tube targets are stored in a dry, clean and light-proof environment to avoid oxidation and surface contamination; the recommended storage temperature is 5-35°C and relative humidity < 50%; they can be re-vacuumed when they have not been used for a long time.
VI HALBLEITERMATERIAL GmbH (VIMATERIAL) employs a stringent quality assurance system to ensure the reliability of our product quality. Strict quality control is implemented throughout the entire production chain, and for defective products, we strictly enforce the principle of rework and redo. Each batch is released only after passing detailed specification tests.
Every batch of our materials is independently tested, and, if necessary, we send samples to certified companies for testing. We provide these documents and analysis certificates with the shipment to certify that our products meet the required standards.
Contact our team of experts today and let us help you with your business!
