Silicon

Silicon sputtering targets are dark-grey solid materials widely used in PVD thin-film deposition for semiconductor, solar cell, display, optical coating and microelectronics applications. With high purity and good thermal and electrical properties, silicon targets are suitable for producing silicon-containing thin films and functional coatings with controlled composition and thickness.

VIMATERIAL supplies monocrystalline and polycrystalline silicon sputtering targets in standard and customized configurations. Targets can be manufactured in different shapes and dimensions according to customer drawings, with optional target bonding services for specific sputtering systems. Contact us for more information.

Physical Properties of Silicon

Silicon Sputtering Target Specifications

For non-standard dimensions, please provide your target drawings, dimensions, sputtering system and application requirements so we can recommend a suitable configuration.

Applications of Silicon Sputtering Target

• Semiconductor and Microelectronics: Silicon sputtering targets are used to deposit silicon-containing thin films and functional layers in semiconductor and microelectronic manufacturing processes, including research and development of advanced device structures.
• Solar Cells and Photovoltaics: Si targets are used in thin-film deposition and coating processes related to photovoltaic devices, where controlled film composition, thickness and uniformity are important for device development and production.
• Display and Transparent Conductive Glass: Silicon-based thin films deposited by sputtering can be used as functional layers in display-related applications and coated glass systems, including processes associated with LCD and other thin-film technologies.
• Architectural and Low-E Glass: Silicon sputtering targets can be used in multilayer coating systems for architectural glass, including Low-E glass, where silicon-containing layers may serve as functional or protective components within the coating stack.
• Optical Coatings: Si targets are used to deposit silicon-containing optical films for applications requiring controlled optical properties, including protective coatings, optical filters and other thin-film optical components.
• Anti-Reflective Coatings: Silicon-containing thin films can be incorporated into multilayer anti-reflective coating systems for photovoltaic, optical and display applications to control surface reflection and optical transmission.

Silicon Alloy Sputtering Targets

In addition to elemental silicon targets, VIMATERIAL supplies a range of silicon alloy sputtering targets for customized thin-film deposition, including:

• AlSi
• SiFe
• SiCr,
• SiGe
• SiMoB

Alloy composition, purity, dimensions and target configuration can be customized according to your deposition process and technical requirements.

Quality Control

VIMATERIAL controls key parameters including material purity, composition, target dimensions, surface condition and structural consistency according to the target specification. For customized targets, production can be carried out based on customer drawings and agreed technical requirements.

Where required, technical documentation such as material specifications, inspection data and relevant quality documents can be provided with the order.

Packaging & Storage

Silicon sputtering targets are supplied in vacuum-sealed inner packaging with protective outer packaging to minimize contamination and physical damage during transportation.

Store in a clean, dry environment at room temperature, keeping the material sealed until use and avoiding unnecessary exposure to moisture, dust and contaminants.

FAQs

Q1. What purity grades of silicon sputtering targets do you provide?

VIMATERIAL currently supplies silicon sputtering targets in 99.999% and 99.9999% purity grades. Other purity requirements can be discussed according to the application.

Q2. Do you supply monocrystalline and polycrystalline silicon targets?

Yes. We supply both monocrystalline and polycrystalline silicon sputtering targets, depending on the customer’s deposition process and application requirements.

Q3. Can the silicon target be customized according to drawings?

Yes. Target dimensions, thickness, shape and other specifications can be customized according to customer drawings and sputtering equipment requirements.

Q4. Do you provide silicon target bonding?

Yes. Target bonding services are available for suitable target and backing-plate configurations. Please provide the target dimensions and equipment requirements for evaluation.

Q5. What shapes of silicon sputtering targets are available?

We can supply plane targets, rotating targets and special-shaped targets. Custom geometries can be considered based on technical drawings.

Q6. What information should I provide for a customized silicon target?

For a customized quotation, it is helpful to provide the purity, target type, dimensions, shape, quantity, backing plate requirements, sputtering system and application. A technical drawing is preferred for non-standard targets.