| Product ID | Formula | Purity | Dimension | Quantity | Price in € | Inquiry |
|---|---|---|---|---|---|---|
| 140700ST001 | Si3N4 | 99.5% | Ø 25.4mm x 3.175 mm | 1 | POR | Inquire |
| 140700ST002 | Si3N4 | 99.5% | Ø 25.4mm x 6.35 mm | 1 | POR | Inquire |
| 140700ST003 | Si3N4 | 99.5% | Ø 50.8mm x 3.175 mm | 1 | POR | Inquire |
| 140700ST004 | Si3N4 | 99.5% | Ø 50.8mm x 6.35 mm | 1 | POR | Inquire |
| 140700ST005 | Si3N4 | 99.5% | Ø 76.2mm x 3.175 mm | 1 | POR | Inquire |
| 140700ST006 | Si3N4 | 99.5% | Ø 76.2mm x 6.35 mm | 1 | POR | Inquire |
| 140700ST007 | Si3N4 | 99.5% | Ø 101.6mm x 3.175 mm | 1 | POR | Inquire |
| 140700ST008 | Si3N4 | 99.5% | Ø 101.6mm x 6.35 mm | 1 | POR | Inquire |
| 140700ST009 | Si3N4 | 99.5% | Ø 203.2mm x 3.175 mm | 1 | 206.00 | Inquire |
| 140700ST010 | Si3N4 | 99.5% | Ø 203.2mm x 6.35 mm | 1 | POR | Inquire |
| 140700ST011 | Si3N4 | 99.5% | 300mm x 186mm x 6mm | 1 | POR | Inquire |
| 140700ST012 | Si3N4 | 99.5% | 378.2mm x 121.15mm x 6.35mm | 1 | 220.00 | Inquire |
| 140700ST013 | Si3N4 | 99.5% | 400mm x 289mm x 10mm | 1 | POR | Inquire |
Silicon nitride sputtering target is a high-performance ceramic material with excellent thermal stability, high hardness, superior mechanical strength, high thermal conductivity, and a low coefficient of thermal expansion. These properties make it an ideal material for thin-film deposition in semiconductor, optical coating, aerospace, energy, and advanced industrial applications.
In addition to sputtering targets, VIMATERIAL also supplies high-purity silicon nitride powders and granules for research and industrial applications.
Standard purity is 99.5%, with round targets available in diameters from 1 to 8 inches and standard thicknesses of 0.125 inch and 0.25 inch.
Custom dimensions, purity levels, bonding options, and backing plates are available upon request.
Vacuum-sealed inner packaging with reinforced wooden outer crates to ensure safe transportation.
Q1. Can you manufacture bonded silicon nitride targets?
Yes. Bonded silicon nitride sputtering targets can be supplied upon request to improve heat dissipation and mechanical stability during sputtering. Different backing plate materials and bonding methods are available depending on your equipment requirements.
Q2. Are custom dimensions available?
Yes. We offer customized diameters, thicknesses, purity levels, and machining tolerances to meet specific sputtering system requirements. Please contact us with your technical specifications for a tailored solution.
Q3. Is RF sputtering recommended for silicon nitride targets?
Yes. Silicon nitride is an electrical insulator, so RF magnetron sputtering is generally recommended for stable plasma generation and high-quality thin film deposition.
Q4. What industries use silicon nitride thin films?
Silicon nitride thin films are widely used in semiconductor devices, optical coatings, solar cells, MEMS, display technologies, and other advanced electronic applications due to their excellent dielectric, mechanical, and chemical properties.
VI HALBLEITERMATERIAL GmbH (VIMATERIAL) employs a stringent quality assurance system to ensure the reliability of our product quality. Strict quality control is implemented throughout the entire production chain, and for defective products, we strictly enforce the principle of rework and redo. Each batch is released only after passing detailed specification tests.
Every batch of our materials is independently tested, and, if necessary, we send samples to certified companies for testing. We provide these documents and analysis certificates with the shipment to certify that our products meet the required standards.
Contact our team of experts today and let us help you with your business!
