Product ID | Formula | Purity | Dimension | Quantity | Price in € | Inquiry |
---|---|---|---|---|---|---|
140700ST001 | Si3N4 | 99.5% | Ø 25.4mm x 3.175 mm | 1 | POR | Inquire |
140700ST002 | Si3N4 | 99.5% | Ø 25.4mm x 6.35 mm | 1 | POR | Inquire |
140700ST003 | Si3N4 | 99.9% | Ø 25.4mm x 3.175 mm | 1 | POR | Inquire |
140700ST004 | Si3N4 | 99.9% | Ø 25.4mm x 6.35 mm | 1 | POR | Inquire |
140700ST005 | Si3N4 | 99.5% | Ø 50.8mm x 3.175 mm | 1 | POR | Inquire |
140700ST006 | Si3N4 | 99.5% | Ø 50.8mm x 6.35 mm | 1 | POR | Inquire |
140700ST007 | Si3N4 | 99.9% | Ø 50.8mm x 3.175 mm | 1 | POR | Inquire |
140700ST008 | Si3N4 | 99.9% | Ø 50.8mm x 6.35 mm | 1 | POR | Inquire |
140700ST009 | Si3N4 | 99.5% | Ø 76.2mm x 3.175 mm | 1 | 206.00 | Inquire |
140700ST010 | Si3N4 | 99.5% | Ø 76.2mm x 6.35 mm | 1 | POR | Inquire |
140700ST011 | Si3N4 | 99.9% | Ø 76.2mm x 3.175 mm | 1 | POR | Inquire |
140700ST012 | Si3N4 | 99.9% | Ø 76.2mm x 6.35 mm | 1 | 220.00 | Inquire |
140700ST013 | Si3N4 | 99.5% | Ø 101.6mm x 3.175 mm | 1 | POR | Inquire |
140700ST014 | Si3N4 | 99.5% | Ø 101.6mm x 6.35 mm | 1 | POR | Inquire |
140700ST015 | Si3N4 | 99.9% | Ø 101.6mm x 3.175 mm | 1 | POR | Inquire |
140700ST016 | Si3N4 | 99.9% | Ø 101.6mm x 6.35 mm | 1 | POR | Inquire |
140700ST017 | Si3N4 | 99.5% | Ø 203.2mm x 3.175 mm | 1 | POR | Inquire |
140700ST018 | Si3N4 | 99.5% | Ø 203.2mm x 6.35 mm | 1 | POR | Inquire |
140700ST019 | Si3N4 | 99.9% | Ø 203.2mm x 3.175 mm | 1 | POR | Inquire |
140700ST020 | Si3N4 | 99.9% | Ø 203.2mm x 6.35 mm | 1 | POR | Inquire |
140700ST021 | Si3N4 | 99.5% | 300mm x 186mm x 6mm | 1 | POR | Inquire |
140700ST022 | Si3N4 | 99.9% | 378.2mm x 121.15mm x 6.35mm | 1 | 732.00 | Inquire |
140700ST023 | Si3N4 | 99.9% | 400mm x 289mm x 10mm | 1 | POR | Inquire |
Silicon nitride sputtering target is a high temperature stable material. Due to its high melting point, high hardness, high strength, high thermal conductivity and low thermal expansion coefficient, it is widely used in aerospace, electronics, energy, chemical industry, nano-processing and other industrial fields.
VIMATERIAL also provides silicon nitride powders and silicon nitride granules.
We provide silicon nitride sputtering targets with a purity of 99.5% and 99.9%. Its diameter ranges from 1 inch to 8 inches round, from 0.125 inches thick and 0.25 inches thick.
(Dimensions, purity specifications, etc. can be customized as required)
In the production of silicon nitride sputtering targets, multiple indicators such as high purity, good crystallinity, and uniform density are required to meet certain requirements. The presence of β phase will affect the physical properties and film-forming properties of silicon nitride and reduce the quality of the material. Therefore, when preparing silicon nitride targets, it is necessary to control the physical conditions and chemical reaction conditions to avoid the formation of β phase. Therefore, silicon nitride targets cannot have β phase.
Semiconductor manufacturing: Silicon nitride sputtering target is often used as an insulating material in semiconductor manufacturing, which can effectively prevent unnecessary reactions between silicon oxide and other substances and ensure the stability of semiconductor performance.
Thin film preparation: Silicon nitride sputtering targets are widely used in thin film preparation, especially in the fields of solar cells, semiconductor devices, display devices and LED manufacturing. Silicon nitride film has good optical, electrical, mechanical and chemical stability, and is an ideal material for preparing high-quality silicon nitride film.
Cemented carbide: Silicon nitride sputtering target performs well in the manufacture of cemented carbide and is suitable for scenes that require wear resistance and corrosion resistance, such as automotive parts and key parts of aerospace.
Heat-resistant materials: Silicon nitride has excellent heat resistance and is often used in heat-resistant materials in high-temperature environments, such as heat-resistant materials for rocket engines and nuclear reactors.
Electromagnetic shielding: In the electromagnetic field, silicon nitride can be used as an electromagnetic shielding material to effectively absorb and shield electromagnetic radiation and prevent electromagnetic interference.
Biomedicine: Silicon nitride sputtering target is used to manufacture artificial joints and dental fillings due to its good biocompatibility and mechanical properties, ensuring that it will not cause adverse reactions in the human environment.
Nanotechnology: Silicon nitride can also be used to prepare various nanostructured materials and devices, such as nanotubes, nanowires and quantum dots, etc..
Inner vacuum package, outer wooden box package.
VI HALBLEITERMATERIAL GmbH (VIMATERIAL) employs a stringent quality assurance system to ensure the reliability of our product quality. Strict quality control is implemented throughout the entire production chain, and for defective products, we strictly enforce the principle of rework and redo. Each batch is released only after passing detailed specification tests.
Every batch of our materials is independently tested, and, if necessary, we send samples to certified companies for testing. We provide these documents and analysis certificates with the shipment to certify that our products meet the required standards.
Contact our team of experts today and let us help you with your business!