Silicon Dioxide

Silicon dioxide sputtering targets are high-purity ceramic materials widely used to deposit insulating, protective, optical, and dielectric thin films. They are suitable for semiconductor, display, optical coating, photovoltaic, and electronic applications, particularly where high purity, optical transparency, chemical stability, and reliable film uniformity are required.

VIMATERIAL supplies SiO₂ sputtering targets in discs, flat plates, pillars, step targets, and other customized geometries. Target dimensions, purity, and configuration can be customized according to your equipment and application requirements.

Contact us for specifications and customized solutions.

Key Features

• High purity
• Excellent optical transparency
• High chemical stability
• Good electrical insulation
• Customizable dimensions

Purity Options

The purity of a SiO₂ sputtering target directly affects impurity levels, deposition performance, and suitability for different applications. VIMATERIAL can provide different purity grades according to customer requirements.

Higher-purity grades require tighter control of raw materials, processing conditions, and contamination throughout the manufacturing process.

Manufacturing process

Silicon dioxide sputtering targets can be manufactured using different ceramic processing and densification technologies, depending on the required purity, density, dimensions, and application.

• Powder Metallurgy: A commonly used route for producing conventional SiO₂ ceramic targets with controlled composition and dimensions.
• Hot Press Sintering: Applies heat and pressure simultaneously to improve material density, mechanical strength, and structural uniformity.
• Hot Isostatic Pressing (HIP): Uses high temperature and isostatic gas pressure to further reduce porosity and improve density and homogeneity for demanding applications.

The selected manufacturing process has a direct influence on target density, porosity, microstructure, sputtering stability, and film quality.

Application of Silicon Dioxide Sputtering Targets

• Semiconductor & Electronic Materials: SiO₂ targets are used to deposit insulating and dielectric films in semiconductor and electronic applications. High-purity targets help minimize contamination and support reliable thin-film performance.
• Optical Coatings: Due to its high optical transparency and chemical stability, SiO₂ is widely used for anti-reflective coatings, protective coatings, and optical thin films on lenses, optical components, and other substrates.
• Display & Thin-Film Applications: SiO₂ sputtering targets can be used in PVD processes to produce insulating, protective, and functional thin films for display and electronic devices.
• Photovoltaic Applications: SiO₂ thin films can be used as protective and optical layers in photovoltaic technologies, including anti-reflective and surface-protection applications.
• Other Applications: SiO₂ coatings are also used where thermal stability, corrosion resistance, electrical insulation, and surface protection are required.

Available Shapes & Customization

VIMATERIAL can supply SiO₂ sputtering targets in various configurations, including:

• Disc / circular targets
• Flat plate targets
• Pillar / cylindrical targets
• Step targets
• Custom-shaped targets

Purity, dimensions, thickness, shape, and packaging can be customized according to customer drawings or technical specifications.

Packaging & Storage

SiO₂ sputtering targets are vacuum-packed internally and protected with outer carton or wooden case packaging to minimize contamination and physical damage during transportation.

Store in a clean, dry environment and keep the package sealed until use to prevent contamination and moisture exposure.

FAQs

Q1. What purity of SiO₂ sputtering target should I choose?

A: The appropriate purity depends on your deposition process and application. 99.9% is suitable for general applications, while 99.99% and 99.995% are recommended for applications with stricter impurity-control requirements.

Q2. Can SiO₂ sputtering targets be customized?

A: Yes. VIMATERIAL can customize purity, dimensions, thickness, shape, and target configuration according to customer drawings or equipment specifications.

Q3. What shapes of SiO₂ targets are available?

A: We supply disc, flat plate, pillar, step, and customized SiO₂ sputtering targets.

Q4. How are SiO₂ sputtering targets packaged?

A: Targets are vacuum-packed and then protected with carton or wooden case packaging, depending on target size and shipping requirements.

Q5. What information should I provide for a customized target?

A: For a quotation, please provide the required purity, target shape, dimensions, thickness, quantity, and application or sputtering equipment information where available.