Silicon Dioxide

Silicon dioxide sputtering targets, whose basic component is silicon dioxide (SiO₂), are used in semiconductor, chemical vapour deposition (CVD) and physical vapour deposition (PVD) displays and optical applications.

VIMATERIAL can supply silica sputtering targets in different shapes: discs, flat plates, pillar targets, step targets, customised…

Purity of Silicon Dioxide Sputtering Targets

The purity of a silica sputtering target directly determines the final application and the price of the material. Silicon dioxide materials of different purity levels have different requirements for production and purification processes.

99.9% purity: Usually used for basic optical coatings or low-end display applications with low requirements.

99.99% purity: Meets some semiconductor manufacturing and optical coating needs, and is significantly more expensive than 99.9% purity materials.

99.999% purity: suitable for high precision semiconductor and optoelectronic applications, its manufacturing cost is very high, because the impurity control in the production process is extremely strict, the production environment and equipment requirements are high.

Manufacturing process of silicon dioxide sputtering targets

The production of silicon oxide targets includes powder metallurgy, hot press sintering, hot isostatic pressing (HIP) and other processes. These processes determine the target’s structural density, porosity and film forming effect, which directly affects the target’s quality and price.

Powder metallurgy: is the basic process, used for conventional target production.

Hot Press Sintering: Used for the production of higher purity targets, which improves the density and strength of the material.

Hot Isostatic Pressing (HIP): the most complex process, which significantly improves target density and uniformity for demanding industrial applications.

Application of Silicon Dioxide Sputtering Targets

Semiconductor manufacturing: Silicon dioxide sputtering targets have important applications in semiconductor manufacturing and are commonly used in the manufacture of semiconductor devices such as integrated circuits and solar cells. Its high purity and good electrical insulation properties make it an ideal material for the preparation of insulating layers for electronic and optoelectronic devices.

Optical applications: Silicon dioxide is also widely used in the optical field. Due to its good optical transparency, silica targets are suitable for the preparation of antireflective and protective layers for optical components, and are particularly good in the visible and some UV regions.

Display manufacturing: In the manufacture of displays, silicon dioxide sputtering targets are used in physical vapour deposition (PVD) and chemical vapour deposition (CVD) for the production of high-quality films and coatings.

Other applications: In addition, silica targets are used to prepare anti-reflective coatings, mainly for solar panels and flat screens. Their heat and corrosion resistance make them stable in a variety of harsh environments, improving the reliability and life of the equipment.

Package of silicon dioxide sputtering target

Inner vacuum packing, outer carton/wooden case packing.