| Product ID | Formula | Purity | Dimension | Quantity | Price in € | Inquiry |
|---|---|---|---|---|---|---|
| 4400ST001 | Ru | 99.95% | Ø 20 mm x 15 mm | 1 | POR | Inquire |
| 4400ST002 | Ru | 99.95% | Ø 50.8 mm x 3.175 mm | 1 | POR | Inquire |
| 4400ST003 | Ru | 99.95% | Ø 101.6 mm x 3.175 mm | 1 | POR | Inquire |
| 4400ST004 | Ru | 99.95% | Ø 101.6 mm x 6.35 mm | 1 | POR | Inquire |
| 4400ST005 | Ru | 99.95% | 200 mm x 50 mm x 5mm | 1 | POR | Inquire |
Ruthenium sputtering targets are a key material for thin film deposition processes such as physical vapour deposition (PVD) and chemical vapour deposition (CVD).
VIMATERIAL offers high-purity ruthenium targets, ruthenium particles, and ruthenium powder. Custom sizes and particle sizes are available upon request. Contact us for more information.
Appearance: Silvery-grey to off-white.
Melting Point: 2310°C, excellent thermal stability.
Density: 12,45 g/m³, ensures dense and uniform films.
Electrical Conductivity: High conductivity for stable sputtering performance.
Thermal Expansion: Low coefficient, ensures dimensional stability.
Semiconductor Industry: Ruthenium sputtering targets are used to form conductive and barrier thin films in semiconductor devices, enabling higher integration, improved performance, and enhanced device reliability.
Optical Applications: Applied in optical coatings such as anti-reflective and reflective films, ruthenium thin films offer excellent optical stability and durability, improving device efficiency and service life.
Chemical Industry: Used in catalyst systems or catalyst preparation, ruthenium provides outstanding catalytic activity, enhancing reaction rate, selectivity, and energy efficiency under milder conditions.
Data Storage: Employed in thin-film layers for data storage devices such as hard disk drives, contributing to higher storage density and faster read/write performance.
The product is packed in sealed, contamination-free containers with protective cushioning materials to prevent mechanical damage, ensuring material purity and integrity during transportation and handling.
Store in a tightly sealed package in a cool, dry, and well-ventilated environment, away from moisture, heat sources, and corrosive substances to maintain product stability and quality.
Q1: What is a ruthenium sputtering target?
A: A ruthenium sputtering target is a high-purity metal material used in thin-film deposition processes. It serves as the source material in physical vapor deposition (PVD) systems to create uniform ruthenium-based coatings on various substrates.
Q2: What is a ruthenium sputtering target used for?
A: Ruthenium sputtering targets are widely used in semiconductor manufacturing, optical coatings, data storage devices, and advanced electronic components to produce conductive, barrier, and functional thin films with high stability and performance.
Q3: How to order a ruthenium sputtering target?
A: You can place an order by contacting our sales team with your required specifications, including purity, size, shape, and application. Customized solutions and technical support are also available upon request.
VI HALBLEITERMATERIAL GmbH (VIMATERIAL) employs a stringent quality assurance system to ensure the reliability of our product quality. Strict quality control is implemented throughout the entire production chain, and for defective products, we strictly enforce the principle of rework and redo. Each batch is released only after passing detailed specification tests.
Every batch of our materials is independently tested, and, if necessary, we send samples to certified companies for testing. We provide these documents and analysis certificates with the shipment to certify that our products meet the required standards.
Contact our team of experts today and let us help you with your business!
