Ruthenium metal

Ruthenium sputtering targets are a key material for thin film deposition processes such as physical vapour deposition (PVD) and chemical vapour deposition (CVD).

Properties

Properties: Ruthenium has the symbol Ru and atomic number 44 and belongs to the platinum group of metallic elements.

Appearance: The metal has a silvery-grey or off-white appearance.

High melting point: Ruthenium has a melting point of 2334°C. This enables it to withstand high energy inputs during the sputtering process without melting or deforming, thus ensuring the stability and service life of the sputtering target.

High density: with a density of 12370 kg/m³, the high density helps to improve the sputtering efficiency and the quality of the film, making the deposited film more uniform and dense.

Good electrical conductivity: Good electrical conductivity is important for the formation of a stable plasma during sputtering and for efficient charge transfer to ensure a smooth sputtering process.

Low Coefficient of Thermal Expansion: A low coefficient of thermal expansion and small dimensional changes during temperature changes help to maintain the dimensional stability of the sputtering target at different temperatures, which is essential for the preparation of high quality films.

Applications

Semiconductor industry: Ruthenium metal sputtering targets are used for the manufacture of thin films in semiconductor chips, such as conductive and barrier layers. Ruthenium metal sputtering targets can help to achieve high performance and high reliability of semiconductor devices, which is important for improving the integration and performance of chips.

Optical field: Ruthenium metal sputtering targets are used in the preparation of coatings for optical devices, such as transmittance enhancement films and reflective films. Ruthenium films have good optical properties and stability, which can improve the optical efficiency and service life of optical devices.

Chemical industry: Ruthenium metal sputtering targets are used as catalyst carriers or directly in the preparation of catalysts. Ruthenium has excellent catalytic properties and can increase the reaction rate and selectivity and reduce the reaction temperature and pressure in chemical reactions.

Data storage: Ruthenium metal sputtering targets are used in the preparation of thin films for data storage devices such as hard discs, helping to increase data storage density and read/write speeds.