Catalogries

Chemical Name:
Nickel silicide
Formula:
NiSi2
Product No.:
281400
CAS No.:
12201-89-7
EINECS No.:
235-379-3
Form:
Sputtering Target
HazMat:

MSDS

TDS

Product ID Formula Purity Dimension Quantity Price in € Inquiry
281400ST001 NiSi2 99.5% Ø 50.8 mm x 3.175 mm 1 POR Inquire
281400ST002 NiSi2 99.5% Ø 76.2 mm x 3.175 mm 1 POR Inquire
281400ST003 NiSi2 99.5% Ø 76.2 mm x 5 mm 1 POR Inquire
Product ID
281400ST001
Formula
NiSi2
Purity
99.5%
Dimension
Ø 50.8 mm x 3.175 mm
Quantity
1
Price in €
POR
Product ID
281400ST002
Formula
NiSi2
Purity
99.5%
Dimension
Ø 76.2 mm x 3.175 mm
Quantity
1
Price in €
POR
Product ID
281400ST003
Formula
NiSi2
Purity
99.5%
Dimension
Ø 76.2 mm x 5 mm
Quantity
1
Price in €
POR

Nickel silicide sputtering target is a key material with high purity, excellent electrical conductivity and thermal stability, which can be used in semiconductor and other fields to prepare high performance thin films by sputtering process.

VIMATERIAL provides Nickel silicide sputtering targets . Our Nickel silicide sputtering targets have high densities, low impurities, homogeneous targets, strong bonding with the substrate, and we can also provide target binding services. Our company has a professional technology research and development team, can accept product customisation, can be small quantities from order, hurry to contact us.

Physical Properties

Molecular formula: Ni₂Si

Molecular weight: 145.472 g/mol or so

Density: about 7.40 g/cm³.

Melting point: around 1255°C

Crystal structure: orthorhombic crystal system, space group Pnma, No.62, lattice constants a = 0.502 nm, b = 0.374 nm, c = 0.708 nm, number of molecules in the cell (Z) is 4.

Applications

Semiconductor manufacturing: It can be used to form high-quality metal silicide contact layers, effectively reducing contact resistance and improving chip performance.

Electronic device packaging industry: Ni₂Si target sputtering to generate a thin film helps to enhance the reliability of the connection between the pin and the chip, and improve the overall stability of the package.

Optoelectronics: Ni₂Si targets can improve the electrical characteristics of photovoltaic components, photoelectric conversion efficiency.

Quality Control

We implement the strictest quality management system for each batch of products, with complete records from raw materials to final products for easy traceability. We adopt strict segregation measures for the handling of non-conforming products to ensure that none of the non-conforming products will flow into the next process.

Packaging and Storage

Nickel silicide sputtering targets are packed in double vacuum bags and then boxed, outside in cartons.

Nickel silicide sputtering targets should be stored in a dry, cool and well-ventilated place, avoiding contact with chemicals, using the original packaging or anti-static bags, and pay attention to dustproof, anti-collision, and regularly check the status.

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QUALITY ASSURANCE

VI HALBLEITERMATERIAL GmbH (VIMATERIAL) employs a stringent quality assurance system to ensure the reliability of our product quality. Strict quality control is implemented throughout the entire production chain, and for defective products, we strictly enforce the principle of rework and redo. Each batch is released only after passing detailed specification tests.

Every batch of our materials is independently tested, and, if necessary, we send samples to certified companies for testing. We provide these documents and analysis certificates with the shipment to certify that our products meet the required standards.

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