Holmium oxide sputtering target is a kind of key material used in magnetron sputtering and other coating technologies, which is made of holmium oxide as the main ingredient through a special processing technology to deposit holmium oxide thin film on the substrate, and is widely used in the fields of optics, electronics, new energy and other key materials.
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Molecular formula: Ho₂O₃
Molecular weight: about 377.86 g/mol
Appearance: light yellow to yellowish brown lumpy ceramic with smooth and dense surface.
Density: 8.36g/cm³ at room temperature, high density ceramic material.
Melting point: about 2415°C
Boiling point: about 3900℃, liquid state at high temperature volatilization is slow.
Crystal structure: cubic crystal system Sc₂O₃ type structure (defective fluorite structure) at room temperature, space group Ia3, lattice constant about 1.06 nm.
Chemical stability: under normal temperature and pressure, it has good chemical stability and is not easy to react with oxygen and moisture in the air.
Good film formation: In the sputtering process, a uniform and dense film can be formed, which is due to the good adhesion and cohesion of holmium oxide atoms after sputtering, and can quickly form a stable film structure on the surface of the substrate. This good film formation is very important for the preparation of high-quality thin-film devices for optics and electronics.
Laser materials: It can be used as a dopant for laser materials for the fabrication of solid-state lasers. By sputtering a thin film of holmium oxide, a uniform dopant layer can be formed on a substrate material such as a laser crystal or glass, thereby improving the performance and efficiency of the laser.
Optical Coatings: Coatings used for optical lenses, optical windows, and other optical components to improve their optical properties.
Optical Storage: Holmium oxide sputtering targets are used to prepare optical storage media in the field of optical storage.
Semiconductor Manufacturing: Holmium oxide sputtering targets are used to prepare thin film structures for semiconductor devices during semiconductor manufacturing.
Each batch of products is subject to a strict quality control system, which is managed through the whole process from R&D, production to transportation and customer service, and strictly follows the 8D problem solving procedure to investigate deviations and fully complies with the requirements of the European Union, ensuring the provision of high-quality products and services.
The products are vacuum-packed and protected by special boxes during transportation to ensure safe transportation.
Holmium Oxide targets need to be sealed and stored in a dry, cool environment, avoiding contact with air, moisture and corrosive substances, with the temperature controlled at room temperature and humidity ≤ 40% RH to prevent oxidative deterioration.
VI HALBLEITERMATERIAL GmbH (VIMATERIAL) employs a stringent quality assurance system to ensure the reliability of our product quality. Strict quality control is implemented throughout the entire production chain, and for defective products, we strictly enforce the principle of rework and redo. Each batch is released only after passing detailed specification tests.
Every batch of our materials is independently tested, and, if necessary, we send samples to certified companies for testing. We provide these documents and analysis certificates with the shipment to certify that our products meet the required standards.
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