Hafnium Oxide

Hafnium Oxide powder is a white crystalline powder composed of hafnium and oxygen elements, with high melting point, high hardness, good chemical stability, high dielectric constant, etc. It is widely used in semiconductors, optics, high temperature materials, nuclear industry and many other fields.

VIMATERIAL offers high-purity hafnium oxide powder with customizable particle sizes. We also provide hafnium oxide particles and hafnium oxide targets. Contact us for more information.

Properties

Chemical formula: HfO₂

Molar mass: 210.49 g/mol

Appearance: usually off-white or white powder

Density: 9.68 g/cm³

Melting point: 2810°C

Boiling point: 5400°C;

Band gap: 5.3 to 5.7 eV, an electrical insulator;

Refractive index: high in the near-ultraviolet to mid-infrared region, e.g. 2.13 at 1700 nm;

Coefficient of thermal expansion: low

Thermal conductivity: 1.1 W/m-K

Young’s modulus: 57 GPa

Electrical resistivity: high, typically 9 × 10⁹ Ω-m.

Applications of Hafnium Oxide Powder

Semiconductor field

• Gate dielectric: Hafnium oxide can replace SiO₂ in MOSFETs, enabling smaller, faster, and more integrated devices.
• Memory devices: Its ferroelectric property allows use in non-volatile memory like FeRAM.

Optical field

• Optical coatings: Improves light transmission, reduces reflection and glare, and provides UV protection.
• Laser materials: Used in near-UV laser components for better performance.

High-temperature ceramics

• Refractory materials: Suitable for furnaces, crucibles, and thermal barrier coatings due to high heat resistance.
• Cutting tools: Enhances hardness and wear resistance for machining hard materials.

Chemical field

• Catalysts: Acts as a catalyst or carrier to improve reaction efficiency and selectivity.

Other fields

• Anti-radiation coatings: Provides protection in radioactive environments.
• Biomedical: Potential use in dental and medical materials.
• Aerospace: Used for high-temperature, wear-resistant components and coatings.

Packaging and Storage

Packaging:

Hafnium oxide powder is typically double-layered (e.g., inner polyethylene bag + outer aluminum foil bag or plastic drum) to prevent moisture absorption or reaction with airborne impurities. A desiccant should be included, and product information, batch number, and precautions should be clearly labeled on the outer packaging to ensure safety and traceability during transportation and use.

Storage:

Hafnium oxide powder should be stored in a dry, cool, and well-ventilated environment, avoiding moisture, high temperatures, and direct sunlight, and kept away from corrosive substances such as acids and alkalis. During storage, the packaging should be kept sealed to prevent moisture absorption, clumping, or contamination.

FAQs

Q1: What is hafnium oxide used for?

A: Hafnium oxide (HfO₂) is an important inorganic compound. Due to its high thermal neutron absorption cross-section, it is a key material for nuclear reactor control rods and also has wide applications in semiconductors, optics, and advanced memory technologies.

Nuclear Energy and High Temperature Engineering: Nuclear reactor control rods and protective materials, high-temperature refractory and coating materials, hafnium metal preparation and precursors.

Semiconductor and Microelectronics: Transistor gate dielectric layers, memory applications, other electronic components.

Optics and Multifunctional Materials: Optical coatings and laser materials, ceramics and catalysts, special functional materials.

Q2: What is the difference between Al2O3 and HfO2?

A: Al₂O₃ (aluminum oxide) and HfO₂ (hafnium oxide) differ mainly in dielectric properties and application focus. Al₂O₃ has a lower dielectric constant but excellent interface quality, high thermal stability, and low leakage, making it suitable for passivation and interface layers. HfO₂ has a much higher dielectric constant, which is beneficial for advanced CMOS scaling and high-density devices, but it has relatively higher leakage and lower thermal stability. In practice, Al₂O₃ is used for stability and interface control, while HfO₂ is used for high-k performance, and combining both can achieve better overall device performance.

Q3: What is hafnium oxide？

A: Hafnium oxide (HfO₂) is an inorganic compound composed of hafnium and oxygen. It is an important functional material belonging to the transition metal oxide family. It possesses a high melting point (approximately 2810℃), high hardness (Mohs hardness 6.5-7.5), and excellent chemical stability, being virtually insoluble in water and most acids (except hydrofluoric acid) at room temperature. These properties make it a core material in high-temperature materials, optical coatings, and electronic devices.

Q4: What is the lead time for hafnium oxide powder?

A: In Stock: Immediate shipping

Standard Products: Generally 2-4 Weeks

Customized Products: Determined based on required details

Special requirements can be discussed