Hafnium Nitride sputtering targets are made from high-purity hafnium nitride material and are widely used in thin film deposition, coating technology, and the semiconductor industry. VImaterial’s hafnium nitride sputtering targets offer excellent chemical stability and hardness, making them suitable for a variety of high-precision thin film applications. They provide a uniform sputtering rate during thin film deposition, enabling precise control of the thickness and quality of the deposited material.
High-Purity Material: Our targets are made from high-purity raw materials, ensuring no impurities during the sputtering process and ensuring high-quality films.
Excellent Thermal Stability: Our targets offer high thermal conductivity and high-temperature resistance, enabling stable operation in high-temperature environments and suitable for deposition processes under various extreme conditions.
Strong Chemical Stability: Our targets are highly resistant to oxidation and corrosion, maintaining long-term stability in a variety of chemical environments.
Wide Applications: Suitable for hard coatings, functional coatings, optical coatings, semiconductor thin films, and other applications, meeting the requirements of high-end thin film deposition processes.
| Parameters | Specifications |
| Chemical Formula | HfN |
| Purity | 99.5% |
| Diameter and Thickness | Customized |
| Density | 12.5 g/cm³ |
| Hardness | 1600 HV |
| Thermal Conductivity | 14 W/m·K |
| Operating Temperature | 1000°C (up to 1500°C) |
| Sputtering Method | DC Sputtering / RF Sputtering / Pulsed Laser Sputtering |
| Crystal Structure | Face-centered Cubic (FCC) |
| Bonding Method | Metal Bonding / Conductive Adhesive / Backplane Soldering |
| Backplane Options | Copper Backplane / Aluminum Backplane / Stainless Steel Backplane |
Hard Coatings and Functional Coatings: Featuring excellent hardness and wear resistance, these films are suitable for surface coatings on cutting tools, molds, electronic components, and other applications, enhancing material durability and scratch resistance.
Optical Coatings: Hafnium nitride films can be used in high-temperature reflective coatings, optical devices, laser reflectors, and other optical components, providing improved reflectivity and resistance to light damage.
Semiconductor Industry: Widely used as radiation-resistant or electrical isolation layers in semiconductor devices, particularly in power electronics, MEMS, and optoelectronics.
Battery Technology: Hafnium nitride thin films can be used in lithium batteries, supercapacitors, and other energy storage devices, improving their conductivity and stability, thereby extending their lifespan.
High Quality Guarantee: Every hafnium nitride sputtering target we provide undergoes rigorous quality testing to ensure its stability and reliability in a variety of high-precision applications.
Customization: Based on your specific needs, we can provide customized services with varying sizes and purities to meet the specific requirements of various sputtering equipment.
Competitive Pricing: As a professional sputtering target manufacturer, VIMATERIAL provides customers with cost-effective products and supports long-term, stable supply.
Technical Support: Our technical team offers comprehensive support and consulting services to help customers resolve various issues related to sputtering target use and ensure a smooth process.
A1: Yes, hafnium nitride targets have excellent thermal stability and can operate stably at temperatures up to 1000°C, making them suitable for high-temperature thin film deposition applications.
A2: Yes, VIMATERIAL offers custom sizes to meet the needs of different sputtering equipment.
A3: We have a professional technical team that supports product customization. Please provide us with relevant information or ideas for evaluation.
A4: When sputtering hafnium nitride, the following points should be noted:
1. Sputtering atmosphere selection: Use nitrogen (N₂) or argon (Ar) as the sputtering gas. Nitrogen helps the hafnium nitride target form a stable nitride film on the substrate.
2. Sputtering Power Control: Maintain an appropriate sputtering power to avoid overheating or evaporation of the target surface, which could affect film quality.
3. Substrate Temperature: The substrate temperature must be controlled within an appropriate range to ensure film quality and uniformity, and to avoid excessive crystallization or brittle cracking.
4. Target Surface Cleaning: Ensure the target surface is free of contaminants. Cleaning can be performed before use to prevent any impact on sputtering performance.
5. Sputtering Rate Monitoring: Maintain a stable sputtering rate to ensure uniform film thickness and adapt to varying deposition requirements.
Hafnium nitride sputtering targets are packaged in strict accordance with international standards prior to shipping. We use anti-static plastic bags, foam, and high-strength outer boxes to protect the targets from damage during transportation. The target surface is also treated with protective treatment to prevent scratches and other mechanical damage during transportation.
We offer a variety of shipping options, including sea, air, and land, to ensure timely and safe delivery. All transportation procedures strictly adhere to international shipping regulations to ensure hafnium nitride targets are in optimal condition upon delivery.
Hafnium nitride targets should be stored in a dry, cool environment, avoiding direct exposure to moisture, corrosive gases, or high temperatures to ensure their performance and quality are not affected.
Hafnium Oxide (HfO2) Sputtering Targets: Used in high-temperature, heat-resistant coatings, capacitors, and optical thin films, they offer excellent electrical properties and chemical stability.
Silicon Nitride (Si3N4) Sputtering Targets: Suitable for the manufacture of electronic components, solar cells, and optical devices, they offer high resistivity and wear resistance.
Tantalum Nitride (TaN) Sputtering Targets: Used in the semiconductor industry, thin-film resistors, and integrated circuits.
We provide comprehensive Hafnium Nitride sputtering target technical documentation, including detailed COA (Certificate of Analysis), TDS (Technical Data Sheet), and MSDS (Material Safety Data Sheet). You can download documentation directly from the product page or leave a message to contact us. We will provide a complete product report tailored to your requirements. Additionally, upon request, we can supply samples for verification by third-party testing laboratories, ensuring full compliance and reliability.
VI HALBLEITERMATERIAL GmbH (VIMATERIAL) employs a stringent quality assurance system to ensure the reliability of our product quality. Strict quality control is implemented throughout the entire production chain, and for defective products, we strictly enforce the principle of rework and redo. Each batch is released only after passing detailed specification tests.
Every batch of our materials is independently tested, and, if necessary, we send samples to certified companies for testing. We provide these documents and analysis certificates with the shipment to certify that our products meet the required standards.
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