| Product ID | Formula | Purity | Dimension | Quantity | Price in € | Inquiry |
|---|---|---|---|---|---|---|
| 403900ST001 | ZrY | 99.9% (Zr + Hf) | Ø 101.6 mm x 6.35 mm | 1 | POR | Inquire |
| 403900ST003 | ZrY | 99.95% (Zr + Hf) | Ø 71 mm x 5 mm | 1 | 352.00 | Inquire |
| 403900ST002 | ZrY | 99.95% (Zr + Hf) | Ø 50.8 mm x 3.175 mm | 1 | 161.00 | Inquire |
| 403900ST004 | ZrY | 99.95% (Zr + Hf) | 279 mm x 93 mm x 8mm | 1 | 890.00 | Inquire |
Zirconium Yttrium Alloy sputtering target is a zirconium-yttrium alloy that is used to deposit thin films of zirconium-yttrium alloy on a substrate by sputtering coating technology to meet specific performance requirements in the fields of electronics and optics.
Characteristics
Density: The density is relatively high, generally around 6-7 g/cm³, high density target can better withstand ion bombardment during sputtering, reduce the sputtering erosion rate of the target, and improve the service life.
Grain size: the grain size is usually between tens of microns and hundreds of microns, the fine and uniform grain structure helps to improve the sputtering uniformity of the target and the quality of the film, so that the film has better adhesion and densification.
Hardness: High hardness, Mohs hardness is about 5-6, which makes the target material has better wear resistance and deformation resistance during processing and use, and can maintain stable dimensional accuracy and shape.
Melting point: the alloying of zirconium and yttrium will make the melting point slightly lower, generally between 1800-2000 ℃, the higher melting point ensures the stability of the target material in the sputtering process, and is not easy to melt or deformation.
Coefficient of thermal expansion: the coefficient of thermal expansion is relatively low, about 5-10×10-⁶/°C, which matches well with the coefficient of thermal expansion of the substrate material, and reduces film defects, such as cracks and spalling, caused by thermal stress during film deposition.
Conductivity: Zirconium Yttrium Alloy has a certain conductivity, usually between 10⁶-10⁷ S/m, good conductivity helps to form a stable plasma in the sputtering process, improve the sputtering efficiency and film deposition rate.
Applications
Semiconductor industry: Zirconium Yttrium Alloy is used in the preparation of various thin films in semiconductor devices, such as metal electrodes, insulating layers, barrier layers, etc. It helps to improve the performance and reliability of semiconductor devices, reduce the size of the devices, and achieve a higher degree of integration.
Optical field: Zirconium Yttrium Alloy can be used in the manufacture of optical films, such as transmittance enhancement film, reflective film, filter film, etc. It can effectively control the propagation and reflection of light, improve the optical performance of optical components, and is widely used in the fields of optical lenses, displays, solar cells, and so on.
Electronic device field: In the manufacture of electronic devices, such as thin film capacitors, magnetic recording media, etc., it can provide high-quality thin film materials to improve the electrical performance and storage performance of the devices, and meet the development needs of high-performance and miniaturization of electronic devices.
VI HALBLEITERMATERIAL GmbH (VIMATERIAL) employs a stringent quality assurance system to ensure the reliability of our product quality. Strict quality control is implemented throughout the entire production chain, and for defective products, we strictly enforce the principle of rework and redo. Each batch is released only after passing detailed specification tests.
Every batch of our materials is independently tested, and, if necessary, we send samples to certified companies for testing. We provide these documents and analysis certificates with the shipment to certify that our products meet the required standards.
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