Zinc Tungstate (Zinc Tungsten Oxide)

Zinc Tungstate sputtering target is a regular appearance, high density, hardness and good chemical stability of the bulk material, with high purity characteristics, mainly used in magnetron sputtering and other coating processes, in the optical field to prepare optical thin films and light-emitting materials, the electronics field to manufacture semiconductor devices and electronic packages, as well as sensors, abrasion-resistant coatings, and other areas to play a key role.

Characteristics

Chemical formula: ZnWO4

Density: 7.5 – 8.5 g/cm3 approx.

Hardness: Typical Mohs hardness can reach about 4 – 5

Appearance: usually white or off-white lumpy solid

Melting point: about 1200℃ – 1300℃.

Thermal conductivity: A certain thermal conductivity can effectively transfer heat during the sputtering process, avoiding damage to the target or affecting the quality of the sputtered coating due to localized heat accumulation.

Chemical stability: It has good chemical stability at room temperature and pressure, but may react chemically with some substances under special environment such as high temperature, strong oxidation or strong reduction. In the sputtering process, it is necessary to choose the appropriate sputtering gas and reaction environment according to the specific process conditions to ensure the chemical stability of the target.

Applications

Optical field:

Optical thin film preparation: it can be used to prepare optical thin films, such as transmittance enhancement film, reflective film and so on. Optical films play an important role in optical instruments, optical sensors, lasers and other devices. The optical thin film prepared by zinc tungstate sputtering target has good optical properties, such as high transmittance and low reflectivity, which can improve the performance and efficiency of optical equipment.

Light-emitting materials: Zinc tungstic acid is a material with good light-emitting properties, and the zinc tungstic acid thin films prepared by sputtering coating process can be used as light-emitting materials in light-emitting diodes (LEDs), flat-panel displays and other fields.

Electronic field:

Semiconductor devices: In the manufacturing process of semiconductor devices, sputter coating is a commonly used process. Zinc tungstate sputtering targets can be used to prepare insulating layers, electrodes and other structures in semiconductor devices. For example, in metal – oxide – semiconductor (MOS) devices, zinc tungstate film can be used as an insulating layer to improve the performance and reliability of the device.

Electronic encapsulation: Electronic encapsulation is the process of encapsulating and protecting electronic components. Sputtering coating can form a thin film of metal or metal compounds on the surface of electronic encapsulation materials to improve the electrical conductivity, heat dissipation and corrosion resistance of the encapsulation materials. Zinc tungstate sputtering targets can be used to prepare functional films in electronic packaging materials to meet the needs of electronic packaging.

Other fields:

Sensors: In the field of sensors, the thin films prepared by zinc tungstate sputtering targets can be used as sensitive materials for the preparation of gas sensors, temperature sensors and so on. For example, by utilizing the adsorption and reaction properties of zinc tungstic acid thin films for certain gases, highly sensitive gas sensors can be prepared.

Wear-resistant coating: Because zinc tungstic acid thin film has high hardness and wear resistance, zinc tungstic acid coating can be prepared on the surface of some materials that need to be wear-resistant to improve the wear resistance and service life of the materials, such as in the surface of tools such as cutting tools, molds and other tools to prepare wear-resistant coatings.