Vanadium Silicide

Vanadium Silicide sputtering target is a compound target composed of vanadium and silicon, mainly used in physical vapour deposition process, through the sputtering effect of V and Si atoms deposited on the substrate, resulting in thin films with high hardness, good thermal stability, etc., which play a key role in the field of semiconductors, electronic devices and other fields.

VIMATERIAL supplies Vanadium Silicide sputtering targets . Our Vanadium Silicide sputtering targets are characterised by high hardness and good stability. We have been devoted to the research of inorganic chemical materials for many years, and also provide the binding service of sputtering targets. We have an experienced and professional team to accept customisation and experiments, please contact us if you need.

Physical Properties

Molecular formula: VSi₂

Molecular weight: 107.07

Appearance: silver grey metallic luster with a smooth surface target

Density: about 4.42g/cm³.

Melting point: above 1700℃

Crystal structure: It belongs to the cubic crystal system and has a crystal structure similar to that of intermetallic compounds, in which vanadium atoms and silicon atoms form a stable lattice structure through the mixing of covalent and metallic bonds, and silicon atoms surround the vanadium atoms in a specific arrangement, which gives VSi₂ a better stability and special physicochemical properties.

Applications

Semiconductor field: Vanadium Silicide sputtering target are used to manufacture the interconnection layer of semiconductor chips. With its good conductivity and thermal stability, VSi₂ is able to effectively reduce the delay in signal transmission and guarantee the electrical performance of the chip when it is running at high speed.

Photovoltaic industry: In the production of solar cell wafers, the target can be used to prepare electrodes or back-contact layers, making use of its unique electrical properties to optimise the photoelectric conversion efficiency of the cell, and contributing to the efficient use of clean energy.

Electronic device encapsulation: As part of the encapsulation material, the thin film formed by VSi₂ sputtering target can enhance the mechanical strength of the encapsulation structure, and at the same time, by virtue of its own chemical stability, it can effectively block the intrusion of external water vapour and impurities, thus prolonging the service life of electronic devices.

Quality Control

Each batch of products follow strict quality control principles, all-round to ensure that each batch of materials from raw material procurement, processing, finished products out of the warehouse have advanced instruments, strict inspection standards, perfect inspection records, to ensure that the quality of the product can be controlled and product traceability, each batch of products are accompanied by MSDS, COA, TDS, PSD, XRD reports, etc., and each batch of products will be provided with samples to the customer, also We support customers to request third party inspection organisations to inspect the products. We will provide customers with samples of each batch of products, and also support customers to request third-party inspection organisations to inspect the products.

Packaging and Storage

Vanadium Silicide sputtering target are packed in double vacuum bags and boxed, then packed in cartons.

Vanadium Silicide sputtering target should be stored in a dry, cool, well-ventilated and temperature-stable environment to avoid moisture and oxidation, as well as to prevent physical impact and keep away from corrosive substances to ensure that their physical and chemical properties are not damaged.