Tungsten Titanium alloy

Tungsten Titanium alloy sputtering target is a tungsten and titanium two metal alloy materials, solid block, smooth surface, with a high melting point, high hardness, good electrical conductivity and thermal stability, mainly used in the physical vapour deposition (PVD) process, in the field of electronics, optics, decorative and other areas can be effectively deposited with a high hardness, abrasion, corrosion and other excellent properties. It is mainly used in the physical vapour deposition (PVD) process.

Characteristic

Composition ratio: The ratio of tungsten and titanium can be adjusted according to the specific needs of the application, the common ones are tungsten and titanium 90:10 (wt%) and tungsten and titanium 95:5 (wt%). Different ratios will affect the performance of the target, for example, when the tungsten content is higher, the hardness and melting point of the target may be increased accordingly.

Purity: High purity is one of the important characteristics of tungsten and titanium alloy sputtering targets, generally the purity can reach 99% and above, and can even reach 99.999%. High purity can reduce the influence of impurities on the performance of sputtered film and improve the quality and stability of the film.

Density: tungsten titanium alloy has a relatively high density, which makes the target material have a better stability in the sputtering process, and can withstand the ion impact in the sputtering process.

Hardness: tungsten-titanium alloy has high hardness, good abrasion resistance and deformation resistance, which can ensure that the target material maintains the stability of shape and size in a long time of use.

Appearance: tungsten-titanium alloy is usually solid block, the surface is relatively smooth, the colour may vary depending on the ratio of tungsten and titanium, generally showing grey or silver-grey and other metallic hues.

Melting point: Tungsten has a high melting point of 3422°C, titanium also has a relatively high melting point, so tungsten-titanium alloy targets have a high melting point, which makes it still maintain stable performance at high temperatures, suitable for high temperature sputtering process.

Microstructure: It has a uniform microstructure with small grain size and uniform distribution. Uniform microstructure helps to improve the uniformity and consistency of sputtered films and reduce defects and flaws in the films.

Electrical properties: tungsten titanium alloy has good electrical conductivity, which can effectively transfer the electric charge during the sputtering process and ensure the efficiency and stability of sputtering. Low electrical resistance reduces energy loss during sputtering and improves energy efficiency.

Thermal properties: high thermal conductivity, can quickly transfer the heat generated in the sputtering process, to avoid local overheating of the target material, so as to extend the service life of the target material. The coefficient of thermal expansion is relatively low, and the dimensional change of the target material is small when the temperature changes, which is conducive to maintaining the precision of sputtered films.

Applications

Semiconductor field: In semiconductor chip manufacturing, tungsten titanium alloy sputtering targets can be used to prepare a variety of thin films, such as conductive films, barrier films and so on. These films are crucial to the performance and reliability of semiconductor devices, and can play a role in conducting electricity, blocking impurity diffusion, and improving device stability.

Flat panel display field: In liquid crystal display (LCD) and organic light-emitting diode (OLED) and other flat panel display technologies, tungsten-titanium alloy sputtering target can be used to prepare electrodes, thin film transistors (TFT) and other key components. Tungsten titanium alloy electrodes have good conductivity and stability, which can ensure the normal operation of the display and high image quality display.

Solar energy field: In the manufacture of solar cells, tungsten titanium alloy sputtering targets can be used to prepare electrodes and reflective layers for solar cells. The electrodes need to have good electrical conductivity to ensure that the solar cell can effectively collect and transmit charges; the reflective layer can improve the solar cell’s absorption efficiency of light, thus improving the photoelectric conversion efficiency of the cell.

The high melting point and good stability of tungsten titanium alloy enable it to maintain stable performance under the working environment of solar cells, ensuring the long-term reliability of solar cells.

Optical coating field: using tungsten-titanium alloy sputtering target can be prepared with specific optical properties of the film, such as anti-reflection film, transparency enhancement film. These films can be applied to optical lenses, camera lenses, laser equipment and other optical devices to improve the performance and service life of optical devices. For example, a layer of tungsten titanium alloy film coated on a camera lens can reduce the reflection and scattering of light and improve the imaging quality of the lens. Tungsten-titanium alloy film can also be used to prepare colour filters, which play an important role in colour display technology.

Magnetic recording field: In the manufacture of magnetic recording media such as hard discs and magnetic tapes, tungsten titanium alloy sputtering targets can be used to prepare the bottom or middle layers of magnetic recording layers. These layers can improve the magnetic properties and stability of magnetic recording media, increase storage density and data reading and writing speed. The good abrasion and corrosion resistance of tungsten-titanium alloy also enables the magnetic recording media to maintain stable performance during long-term use, ensuring reliable data storage.

Wear-resistant coating field: Since tungsten titanium alloy has high hardness and wear resistance, it can be sputter deposited on the surface of mechanical parts, cutting tools, moulds, etc. to form wear-resistant coatings and improve the service life and performance of these parts. For example, a tungsten-titanium alloy coating on parts of an automobile engine can reduce wear and friction and improve the efficiency and reliability of the engine.

In the aerospace field: some critical components also use wear-resistant coatings prepared by tungsten titanium alloy sputtering targets to cope with harsh working environments and demanding performance needs.