| Product ID | Formula | Purity | Dimension | Quantity | Price in € | Inquiry |
|---|---|---|---|---|---|---|
| 220700ST001 | TiN | 99.5% | Ø 25.4mm x 6.35mm | 1 | POR | Inquire |
| 220700ST002 | TiN | 99.5% | Ø 50.8mm x 3.175mm | 1 | POR | Inquire |
| 220700ST003 | TiN | 99.5% | Ø 50.8mm x 6.35mm | 1 | POR | Inquire |
| 220700ST004 | TiN | 99.5% | Ø 76.2mm x 3.175mm | 1 | POR | Inquire |
| 220700ST005 | TiN | 99.5% | Ø 76.2mm x 6.35mm | 1 | POR | Inquire |
Titanium Nitride sputtering target is a compound material composed of titanium and nitrogen, which is mainly used in the sputtering process of Physical Vapour Deposition (PVD) technology, and is capable of depositing titanium nitride thin films with high hardness, good abrasion resistance, chemical stability, and a golden yellow appearance on the substrate.
We supply Titanium Nitride sputtering targets, VIMATERIAL can also provide target binding service, our products are subject to customisation and experimentation, please contact us if you need.
Molecular formula: TiN
Molecular weight: 61.88
Appearance: Usually golden yellow, metallic lustre, smooth surface.
Density: about 5.43 g/cm³.
Melting point: about 2950°C
Boiling point: about 4200°C
Crystal structure: Face-centred cubic (FCC) structure, titanium atoms are located at the corner tops and face-centres of the cube, and nitrogen atoms fill the interstices of the octahedron formed by the titanium atoms.
Cutting tools: TiN films are deposited on the surface of cutting tools to significantly improve the hardness, wear resistance and thermal stability of cutting tools, extend tool life and improve machining efficiency.
Electronic devices: as a diffusion barrier between metals and semiconductors, it prevents the diffusion of atoms between different materials and ensures the stability and reliability of electronic devices.
Decorative coating field: with its golden appearance and good chemical stability, it is widely used in jewellery, watch, building decoration and other industries to enhance the aesthetics and corrosion resistance of products.
Mould manufacturing: By sputtering TiN films on the surface of moulds, it reduces the friction between moulds and moulding materials, reduces the resistance to demoulding, and improves the anti-wear ability of moulds to prolong the life of moulds.
Solar Cells: As a buffer layer for transparent conductive electrodes, TiN films optimise the charge transfer within the cell and improve the photoelectric conversion efficiency, helping to improve the performance of solar cells.
Our products are subject to a strict quality management system. There are strict inspection standards for incoming materials, processing, final inspection and factory inspection. Strict isolation measures are taken for unqualified processing to prevent unqualified products from flowing into the next process. Samples are provided for customer re-inspection according to customer requirements.
Titanium Nitride sputtering targets are packed in double-layer vacuum bags and then boxed and packed in cartons.
Titanium Nitride sputtering targets should be stored in a dry, cool and well-ventilated environment, avoiding moisture, avoiding contact with strong corrosive substances, and at the same time preventing the targets from physical damage such as collision and friction, to ensure that their physical and chemical properties are not affected.
VI HALBLEITERMATERIAL GmbH (VIMATERIAL) employs a stringent quality assurance system to ensure the reliability of our product quality. Strict quality control is implemented throughout the entire production chain, and for defective products, we strictly enforce the principle of rework and redo. Each batch is released only after passing detailed specification tests.
Every batch of our materials is independently tested, and, if necessary, we send samples to certified companies for testing. We provide these documents and analysis certificates with the shipment to certify that our products meet the required standards.
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