| Product ID | Formula | Purity | Dimension | Quantity | Price in € | Inquiry |
|---|---|---|---|---|---|---|
| 6900ST001 | Tm | 99.9% (REO) | Ø 20 mm x 14 mm | 1 | POR | Inquire |
| 6900ST002 | Tm | 99.9% (REO) | Ø 50.8 mm x 3.175 mm | 1 | POR | Inquire |
| 6900ST003 | Tm | 99.9% (REO) | Ø 76.2 mm x 3.175 mm | 1 | POR | Inquire |
Thulium sputtering target is made of thulium metal as the main component for sputtering coating through a specific process. It has the characteristics of high purity, good electrical and thermal conductivity, specific crystal structure and physicochemical stability, etc. It can provide uniform thulium element coating for the substrate material during sputtering, and it is widely used in the fields of electronics, optics, etc. in order to improve the performance of the material or to give special functions.
VIMATERIAL provides Tm sputtering target in various specifications and supports target binding service. We accept customization of products, contact us.
Molecular Formula: Tm
Molecular weight: 168.93421
Appearance: Silver-white metal target
Density: 9.3208g/cm³(20℃)
Melting point: 1545°C
Boiling point: 1947°C
Crystal structure: hexagonal crystal system
Semiconductor field: Thulium sputtering targets are used to prepare semiconductor thin films in the semiconductor manufacturing process, These thin films are important for the performance and performance of semiconductor devices. These films play a key role in the performance and reliability of semiconductor devices.
Optical field: Used in the manufacture of optical films, such as transmittance enhancement films, reflective films, and so on. Thulium metal sputtering targets can deposit thin films with specific optical properties on the surface of optical elements, thus improving the performance of optical elements.
Flat panel display field: In the manufacture of flat panel displays, such as liquid crystal displays (LCDs) and organic light-emitting diodes (OLEDs), thulium metal sputtering targets can be used to prepare electrode materials and functional films.
Solar cell field: It can be used to prepare thin film materials for solar cells, for example, in thin film solar cells, the semiconductor film formed by sputtering coating can improve the photoelectric conversion efficiency of solar cells.
Each batch of products strictly guards the quality, from the selection of raw material suppliers, to the use of advanced testing equipment to accurately monitor the entire production process, to the finished product through many rounds of harsh sampling and third-party authoritative certification, to all-round, zero-tolerance quality control system to ensure that each batch of products meets and exceeds the industry’s high standards, to provide our customers with the best quality and most stable products.
Thulium sputtering target is boxed after double vacuum bagging and packed in outer carton to ensure transportation safety.
Thulium sputtering targets should be stored in a dry, clean, suitable temperature (generally room temperature 15 ℃ -25 ℃) and no corrosive gases in the environment, need to be packed in vacuum packaging or sealed containers to prevent oxidation and contamination, storage should be avoided with sharp objects in order to prevent scratching the surface of the target.
VI HALBLEITERMATERIAL GmbH (VIMATERIAL) employs a stringent quality assurance system to ensure the reliability of our product quality. Strict quality control is implemented throughout the entire production chain, and for defective products, we strictly enforce the principle of rework and redo. Each batch is released only after passing detailed specification tests.
Every batch of our materials is independently tested, and, if necessary, we send samples to certified companies for testing. We provide these documents and analysis certificates with the shipment to certify that our products meet the required standards.
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