Tellurium (IV) Oxide

Tellurium (IV) Oxide sputtering target is a material with tellurium dioxide as its main component, which is in solid state and is used in processes such as physical vapour deposition, whereby thin films of tellurium dioxide can be deposited on a substrate by sputtering for applications in optics, electronics and many other fields.

Characteristics

Chemical formula: TeO₂.

Molecular weight: 209.94

Chemical stability: Tellurium (IV) Oxide is stable at room temperature and pressure, but can react with acids and bases under certain conditions.

Appearance: usually a white solid target, but the actual appearance may vary slightly depending on factors such as preparation process and purity.

Density: There are two crystal types, the rhombohedral crystal system (yellow mineral telluric acid form β-TeO₂) has a density of about 5.670g/cm³, and the tetragonal crystal system (synthetic colourless variant telluric acid form α-TeO₂) has a density of about 6.04g/cm³.

Melting point: between 950°C and 1012°C.

Boiling point: about 1245°C

Solubility: insoluble in water

Sputtering rate: In the sputtering process, the sputtering rate will be affected by the sputtering power, working gas pressure, the distance between the target material and the substrate and other factors. Generally speaking, under suitable sputtering conditions, Tellurium (IV) Oxide sputtering targets can achieve a relatively stable sputtering rate to meet the needs of thin film deposition.

Thin film quality: The thin film obtained by sputtering deposition of this target has good uniformity and denseness, which can meet the requirements for thin film quality in the fields of optics and electronics.

Thermal conductivity: The thermal conductivity is relatively low, and care needs to be taken to control the energy input during the sputtering process to avoid defects in the target due to local overheating.

Optical properties: It has unique properties in optics, and can be used to prepare optical films, such as for anti-reflection coatings, beam splitters and other optical devices.

Applications

Electronic field:

Semiconductor manufacturing: can be used in the manufacturing process of semiconductor devices, such as the preparation of semiconductor films. The deposition of Tellurium (IV) Oxide thin films on the wafer surface through the sputter coating process can improve the electrical properties of semiconductors, such as increasing carrier mobility, reducing resistance, etc., which is important for the manufacture of high-performance integrated circuits and chips.

Electronic Control Devices: Used to make thin film resistors, capacitors, and other components in electronic control devices, Tellurium (IV) Oxide sputtering targets provide precise film thickness and uniformity, resulting in stable performance and reliable operating characteristics for these electronic components.

Optical field:

Optical Coating: Coating is applied to optical elements such as optical lenses, lenses, prisms, etc. to improve their optical properties.Tellurium (IV) Oxide films can increase the reflectivity, transmittance, or absorptivity, etc., of optical elements, e.g., for manufacturing antireflective coatings, transmittance-enhancing films, beamsplitters, etc. It has a wide range of applications in laser systems, optical communications, optical imaging and other fields, and can improve the efficiency and performance of optical systems.

Infrared Optics: In the field of infrared optics, Tellurium (IV) Oxide has good infrared transmittance and optical properties, and can be used to manufacture infrared optics devices, such as infrared detectors and infrared windows. Tellurium (IV) Oxide films prepared by sputtering targets can improve the infrared response and optical quality of these devices.

Solar cell field: It can be applied in the manufacture of solar cells as the functional layer or electrode material of the cell. For example, in thin-film solar cells, thin Tellurium (IV) Oxide films can be used as an absorber or buffer layer to improve the photovoltaic conversion efficiency and stability of solar cells.

Data storage field: Coating for magnetic and optical recording media to improve the performance and capacity of storage media. For example, in storage devices such as hard discs and compact discs, Tellurium (IV) Oxide sputtering targets can be prepared to produce high quality films that increase data storage density and read/write speed.

Sensor field: Tellurium dioxide thin films have sensitive properties to certain gases or physical quantities, and can be used to manufacture gas sensors, temperature sensors, pressure sensors, etc. Thin film sensors prepared by sputtering targets have high sensitivity, fast response and good stability.