Catalogries

Chemical Name:
Tantalum Nitride
Formula:
TaN
Product No.:
730700
CAS No.:
12033-62-4
EINECS No.:
234-788-4
Form:
Sputtering Target
HazMat:
Product ID Formula Purity Dimension Quantity Price in € Inquiry
730700ST001 TaN 99.5% Ø 25.4 mm x 6.35 mm 1 POR Inquire
730700ST002 TaN 99.5% Ø 50.8 mm x 3.175 mm 1 POR Inquire
730700ST003 TaN 99.5% Ø 76.2 mm x 3.175 mm 1 POR Inquire
730700ST004 TaN 99.5% Ø 101.6 mm x 6.35 mm 1 POR Inquire
730700ST005 TaN 99.5% Ø 203.2 mm x 6.35 mm 1 POR Inquire
Product ID
730700ST001
Formula
TaN
Purity
99.5%
Dimension
Ø 25.4 mm x 6.35 mm
Quantity
1
Price in €
POR
Product ID
730700ST002
Formula
TaN
Purity
99.5%
Dimension
Ø 50.8 mm x 3.175 mm
Quantity
1
Price in €
POR
Product ID
730700ST003
Formula
TaN
Purity
99.5%
Dimension
Ø 76.2 mm x 3.175 mm
Quantity
1
Price in €
POR
Product ID
730700ST004
Formula
TaN
Purity
99.5%
Dimension
Ø 101.6 mm x 6.35 mm
Quantity
1
Price in €
POR
Product ID
730700ST005
Formula
TaN
Purity
99.5%
Dimension
Ø 203.2 mm x 6.35 mm
Quantity
1
Price in €
POR

Tantalum nitride targets are an important tool for the preparation of thin film materials.

Basic information:

Chemical composition: the main component is tantalum nitride (TaN), composed of tantalum (Ta) and nitrogen (N) elements.
Crystal structure: Generally hexagonal crystal structure, the lattice constant will vary depending on the preparation process and conditions.
Appearance: Usually appears as a yellow-brown lumpy solid, after fine processing, the surface is relatively flat and smooth.
Density: Relatively high density, about 14.36g/cm³.
Hardness: high hardness, with good abrasion resistance and scratch resistance.
Melting point: melting point up to 3090°C, with excellent high temperature resistance.

Application areas:

Semiconductor industry: In semiconductor manufacturing, it is used in physical vapour deposition (PVD) and chemical vapour deposition (CVD) processes to prepare conductive thin films, barrier layers, etc., e.g., it plays the role of connecting circuits and preventing the diffusion of metal ions in integrated circuits.

Optical field: It is used to prepare optical films, such as anti-reflective film, transmittance enhancement film, etc., which can improve the performance of optical components and increase the resolution and transmittance of optical systems.

Electronic component field: It can be used to manufacture electronic components such as chip resistors, and Tantalum Nitride resistors can resist the erosion of water vapour and increase the stability of electronic components.

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QUALITY ASSURANCE

VI HALBLEITERMATERIAL GmbH (VIMATERIAL) employs a stringent quality assurance system to ensure the reliability of our product quality. Strict quality control is implemented throughout the entire production chain, and for defective products, we strictly enforce the principle of rework and redo. Each batch is released only after passing detailed specification tests.

Every batch of our materials is independently tested, and, if necessary, we send samples to certified companies for testing. We provide these documents and analysis certificates with the shipment to certify that our products meet the required standards.

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