Silicon Monoxide

Silicon monoxide sputtering target is a specialised material used to form thin films in the Physical Vapour Deposition (PVD) process. It is a compound of the elements silicon and oxygen and is known for its unique optical, electrical and chemical properties.

VIMATERIAL also offers Silicon Monoxide Powder, Silicon Monoxide Pellets.

Properties of Silicon Monoxide

Appearance: black brown to loess

Melting point: 1702°C

Boiling point: 1880°C

Density: 2.13g/cm

Application of Silicon Monoxide Sputtering Targets

1. Semiconductor materials: Because Silicon monoxide has high purity and excellent physical properties, it is an important raw material for preparing semiconductor materials. By doping with other elements, the conductive properties of SiO can be adjusted to meet the needs of different electronic devices.

2. Optical materials: Silicon monoxide has high transparency and good optical properties, so it is often used as a material for preparing optical lenses, prisms and other optical components.

3. Ceramic materials: SiO is also an important component for preparing high-performance ceramics. These ceramic materials have excellent properties such as high temperature resistance and corrosion resistance, and are widely used in aerospace, automobile manufacturing and other fields.

Preparation of of silicon monoxide sputtering targets

Powder sintering:

Silicon monoxide powder is compressed and sintered under vacuum or inert gas to form a dense target.

Hot pressing:

Increases the density of the target and reduces porosity for uniform sputtering.

Bonding:

The target is typically bonded to a backing plate (usually copper) to improve thermal conductivity and prevent cracking during sputtering.

Silicon Monoxide Sputtering Target Specifications

Purity: ≥99.9%

Density: typically 2.13 g/cm³.

Size: Customised to suit deposition system requirements.

Backing plate: typically copper or molybdenum for thermal stability.