Rhodium metal sputtering target is a kind of rhodium metal as raw material, made by vacuum induction melting, extrusion, rolling and other processes, has the characteristics of high purity, high melting point, high hardness, etc., the shape is usually round, square, etc., with a variety of sizes, mainly used in electronic semiconductors, magnetic recording media, thin film solar energy, flat panel display, etc., the field of thin film deposition materials.
Properties
Chemical symbol: Rh
Atomic number: 45
Relative atomic mass: 102.90550(2) Dalton
CAS Number: 7440-16-6
Appearance: usually a silvery grey metallic solid with a high gloss.
Density: Relative density is high, which makes it have better stability and inertia in sputtering process, which is favourable for the formation of uniform film.
Melting point: high melting point, about 1966 ℃, which means that in the sputtering process requires high energy to make its atoms from the target surface sputtering out, but the higher melting point also makes it in the high temperature environment has a better stability, not easy to deformation or melting.
Hardness: Higher hardness, better abrasion resistance and corrosion resistance, able to maintain a better shape and structure in the sputtering process, so as to ensure the quality and stability of the film.
Applications
Electronic semiconductor field: In the semiconductor chip manufacturing process, rhodium metal sputtering targets can be used to prepare conductive layers, barrier layers and other thin films, which have an important impact on the performance and reliability of the chip. For example, in the metallisation process of integrated circuits, rhodium films are deposited on silicon wafers by sputter coating technology to form conductive lines and electrodes.
Magnetic recording media field: Thin film coatings used in the production of magnetic recording media such as hard discs and magnetic tapes can increase the storage density and read/write speed of magnetic recording media.
Thin film solar energy field: In the manufacture of thin film solar cells, rhodium metal sputtering targets can be used to prepare thin films such as electrodes and reflective layers of solar cells, which can improve the photoelectric conversion efficiency and stability of solar cells.
Planar display field: It can be used to prepare thin films for liquid crystal display (LCD), organic light-emitting diode (OLED) and other planar display devices, such as electrode film, reflective film, etc., to improve the performance and picture quality of planar display devices.
VI HALBLEITERMATERIAL GmbH (VIMATERIAL) employs a stringent quality assurance system to ensure the reliability of our product quality. Strict quality control is implemented throughout the entire production chain, and for defective products, we strictly enforce the principle of rework and redo. Each batch is released only after passing detailed specification tests.
Every batch of our materials is independently tested, and, if necessary, we send samples to certified companies for testing. We provide these documents and analysis certificates with the shipment to certify that our products meet the required standards.
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