Niobium Zirconium Alloy sputtering target is an important coating material composed of niobium and zirconium with high purity, specific physicochemical properties and excellent performance, which is prepared by melt casting or powder metallurgy and is widely used in electronics, optics, and energy fields.
Properties
Density: Niobium has a density of about 8.57 g/cm³, Zirconium has a density of about 6.52 g/cm³, and Niobium Zirconium Alloy has an in-between density of about 7 – 8 g/cm³, which helps to control the deposition rate and thickness uniformity of the film during the sputtering process.
Melting point: Niobium has a melting point of about 2468°C, zirconium has a melting point of about 1852°C, and the alloy has a relatively high melting point, usually around 2000°C, which allows it to withstand high energy inputs without melting and deformation, ensuring the stability and reproducibility of the sputtering process.
Thermal conductivity: The thermal conductivity is relatively low, so the temperature of the target needs to be controlled during the sputtering process to prevent the target from rupturing due to thermal stress.
Grain size: Small and uniform grain size helps to improve sputtering efficiency and film quality, generally the average grain size is below 100μm.
Oxidation resistance: good oxidation resistance at room temperature, but at high temperature, high humidity and other harsh environments, it is still necessary to take appropriate protective measures to prevent oxidation on the performance of the target.
Chemical stability: Niobium Zirconium Alloy has good chemical stability, it is not easy to react with common chemical substances, but in some strong acids and alkalis and other corrosive media, chemical reactions may occur, so in the use and storage process need to pay attention to avoid contact with these substances.
Applications
Electronic devices: Niobium Zirconium Alloy can be used to prepare thin film materials such as electrodes, wiring and insulating layers in electronic devices to improve the performance and reliability of the devices. For example, in semiconductor chip manufacturing, it can be used to make wafer conductive layer, blocking layer, etc..
Optical field: Niobium Zirconium Alloy is used in the preparation of optical films, such as transmittance enhancement film, reflective film, filter film, etc., which can be applied to optical lenses, displays, solar cells and other fields, to improve optical performance and energy conversion efficiency.
Energy: In new energy batteries, Niobium Zirconium Alloy can be used to prepare thin films for battery electrode materials, improving the performance and life of the battery.
VI HALBLEITERMATERIAL GmbH (VIMATERIAL) employs a stringent quality assurance system to ensure the reliability of our product quality. Strict quality control is implemented throughout the entire production chain, and for defective products, we strictly enforce the principle of rework and redo. Each batch is released only after passing detailed specification tests.
Every batch of our materials is independently tested, and, if necessary, we send samples to certified companies for testing. We provide these documents and analysis certificates with the shipment to certify that our products meet the required standards.
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