Niobium silicide sputtering target (NbSi₂) is an intermetallic compound composed of niobium and silicon. It features a hexagonal crystal structure, high melting point, good electrical conductivity, and excellent thermal stability, making it an important material for high-temperature and advanced thin-film applications.
VIMATERIAL supplies niobium disilicide sputtering targets with customized dimensions and specifications to meet different deposition requirements. For product specifications, customization options, and quotations, please contact us.
| Property | Value |
| Chemical Formula | NbSi₂ |
| Molecular Weight | 149.08 g/mol |
| CAS Number | 12034-80-9 |
| Appearance | Gray solid |
| Density | Approx. 5.70 g/cm³ |
| Melting Point | Approx. 1,950°C |
| Crystal Structure | Hexagonal |
| Material Classification | Transition Metal Silicide |
Note: The values above are typical reference properties of NbSi₂. Actual sputtering target properties may vary depending on composition, manufacturing process, and densification.
Each batch of our products undergoes strict quality inspection, from raw material selection to finished product testing.
VIMATERIAL emphasizes consistent material composition, dimensional accuracy, surface quality, and product traceability. Relevant quality documentation can be provided according to customer requirements.
For more information, please visit our Quality Control page.
Niobium silicide sputtering targets are carefully packed with protective materials to prevent contamination and mechanical damage during transportation. Inner and outer packaging can be arranged according to target dimensions and shipping requirements.
Store NbSi₂ sputtering targets in a clean, dry, and well-ventilated environment. Keep them in their original protective packaging until use. Handle carefully to avoid scratches, cracks, and mechanical impact.
VIMATERIAL provides customized NbSi₂ sputtering targets for research, development, and industrial thin-film deposition applications.
We can discuss customized specifications according to customer requirements, including:
Please contact VIMATERIAL for product availability, technical specifications, and quotations.
NbSi₂ sputtering targets are used to deposit niobium silicide thin films. These films are investigated for high-temperature protective coatings, electronic materials, thin-film sensors, and advanced materials research.
Niobium disilicide is characterized by its high melting point, hexagonal crystal structure, good electrical conductivity, and thermal stability. These properties make it an interesting material for high-temperature and functional thin-film applications.
NbSi₂ has a hexagonal crystal structure. Its intermetallic structure contributes to its characteristic thermal and electrical properties.
Yes. Customized niobium disilicide sputtering targets can be discussed according to customer requirements, including different shapes, dimensions, thicknesses, and technical drawings.
Target bonding services can be discussed according to the target dimensions, backing plate material, and sputtering equipment requirements. Please contact our team for further information.
VI HALBLEITERMATERIAL GmbH (VIMATERIAL) employs a stringent quality assurance system to ensure the reliability of our product quality. Strict quality control is implemented throughout the entire production chain, and for defective products, we strictly enforce the principle of rework and redo. Each batch is released only after passing detailed specification tests.
Every batch of our materials is independently tested, and, if necessary, we send samples to certified companies for testing. We provide these documents and analysis certificates with the shipment to certify that our products meet the required standards.
Contact our team of experts today and let us help you with your business!