Niobium Silicide sputtering target is an important functional material with chemical formula NbSi₂, hexagonal crystal structure, high melting point, high hardness, good electrical conductivity and high-temperature oxidation resistance, etc. It is prepared by powder metallurgy and widely used in the fields of electronic device manufacturing, high-temperature structural parts protection, thin-film sensors and optoelectronic device manufacturing.
Characteristics
Chemical composition: the main component is NbSi₂, of which the ratio of niobium (Nb) and silicon (Si) is relatively fixed.
Crystal structure: Hexagonal crystal system.
Density: generally around 5.6-6.2 g/cm³.
Melting point: usually around 1950℃.
Hardness: Vickers hardness between 5.88-6.88 GPa.
Electrical properties: good electrical conductivity in a certain temperature range, its resistivity is about 10-⁶-10-⁵ Ω・m.
Thermal properties: Thermal conductivity is between 10-20 W/(m・K), and the coefficient of thermal expansion is about 6-8×10-⁶ K-¹.
Sputtering properties: Sputtering threshold voltage is relatively low, generally between 200-300 V, and sputtering rate is moderate, usually around 0.1-0.5 Å/s.
Applications
Electronic Device Manufacturing: Niobium Silicide sputtering targets are used in integrated circuits for the preparation of metallization layers, diffusion barrier layers, contact electrodes and other components. Its good conductivity and high-temperature stability can ensure the effective transmission of electronic signals and the reliability of electronic devices under high-temperature working conditions, and improve the performance and integration of integrated circuits.
Protection of high-temperature structural components: high-temperature structural components in aerospace, energy and other fields, such as turbine blades, engine combustion chambers, etc., are faced with high temperature, high pressure, oxidation and other harsh working environments. coatings prepared with NbSi₂ sputtering targets can effectively improve the oxidation, wear and thermal corrosion resistance of these components, extend their service life and ensure the safe and stable operation of the equipment.
Thin-film Sensor Preparation: Based on the property that the physical properties of Niobium Silicide change with the external environment, thin-film sensors can be prepared for detecting physical quantities such as temperature, pressure, gas, or chemical substances. For example, temperature sensors made by sputtering Niobium Silicide films can accurately measure temperature changes in high-temperature environments, and have the advantages of fast response speed, high precision, and good stability.
Optoelectronic device manufacturing: In optoelectronic devices, such as photodetectors, light-emitting diodes, etc., Niobium Silicide sputtering targets can be used for the preparation of optical thin films, electrode materials, and so on. Its unique optical and electrical properties can regulate the photoelectric conversion efficiency and luminescence performance of optoelectronic devices, providing support for the high performance of optoelectronic devices.
VI HALBLEITERMATERIAL GmbH (VIMATERIAL) employs a stringent quality assurance system to ensure the reliability of our product quality. Strict quality control is implemented throughout the entire production chain, and for defective products, we strictly enforce the principle of rework and redo. Each batch is released only after passing detailed specification tests.
Every batch of our materials is independently tested, and, if necessary, we send samples to certified companies for testing. We provide these documents and analysis certificates with the shipment to certify that our products meet the required standards.
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