Niobium Nitride

Niobium Nitride sputtering target is a kind of important coating material with chemical formula NbN, with excellent superconductivity, high hardness and wear resistance, and good electrical and optical properties, which is prepared by physical vapor deposition method and widely used in the fields of electronic devices, superconductivity, optics and photonics, and surface engineering.

Characteristics

Chemical formula: NbN

Molecular weight: 106.91

Appearance: Usually black or dark gray solid.

Density: about 7.3-7.8 g/cm³, its density is relatively moderate, in the sputtering process can better control the deposition rate and thickness uniformity of the film.

Melting point: high, about 2573 ℃, which makes it able to withstand high energy input in the sputtering process without melting and deformation, ensuring the stability and repeatability of the sputtering process.

Stability: It has good chemical stability at room temperature and pressure, and is not easy to react with common chemical substances. However, chemical reactions may occur under specific conditions such as some strong oxidizing agents or strong acids.

Purity: The common purities are 99.5%, 99.9%, 99.95%, 99.99%, etc. High purity niobium nitride sputtering targets can ensure that the introduction of impurities is reduced during the sputtering coating process, thus improving the quality and performance of the film.

Superconductivity: Niobium Nitride has excellent superconductivity properties, its superconducting transition temperature is relatively high, generally around 16K, which makes it has important application prospects in superconducting electronic devices, quantum computing and other fields.

Optical properties: it has certain absorption and reflection properties in the infrared wavelength band, and can be used in the preparation of optical films in infrared optical devices, such as the absorption layer of infrared detectors, anti-reflection coatings for optical windows, etc., to improve the performance and sensitivity of optical devices.

Applications

Electronic devices: In the field of integrated circuits, semiconductor devices and other electronic fields, Niobium Nitride sputtering targets can be used to prepare thin film materials such as electrodes, wiring, and barrier layers to improve the performance and reliability of electronic devices. For example, in the manufacture of ultra-large-scale integrated circuits, Niobium Nitride films can be used as a barrier layer for copper interconnections, preventing the diffusion of copper atoms and improving the stability and reliability of circuits.

Superconductivity Technology: Due to its excellent superconducting properties, Niobium Nitride sputtering targets are widely used in the preparation of superconducting devices such as superconducting quantum bits, superconducting sensors, and superconducting magnets. For example, in superconducting quantum bits, NbN films can be used as materials for Josephson junctions to realize the manipulation and reading of quantum bits, which provides key support for the development of quantum computing.

Optics and optoelectronics: It can be used to prepare optical films, such as absorption layers for infrared detectors, anti-reflective coatings for optical windows, and high-reflective coatings for laser mirrors, etc., to improve the performance and sensitivity of optical devices. In the field of optical communication, Niobium Nitride thin film can also be used as the material of optical waveguide to realize the transmission and modulation of optical signals, which provides technical support for high-speed optical communication.

Surface Engineering: By sputtering NbN films, the hardness, abrasion resistance, corrosion resistance and other properties of the material surface can be improved, which is widely used in the field of surface reinforcement of cutting tools, molds, mechanical parts and so on. For example, in tool coating, NbN film can significantly improve the cutting performance and service life of the tool, reduce the processing cost and improve productivity.