Nickel Niobium Alloy sputtering target is an alloy material with nickel and niobium as the main components. In the sputtering process of physical vapour deposition, the target atoms are deposited onto the surface of the substrate to form a thin film by ion bombardment, which is mainly used in the fields of electronics, optics, semiconductors, etc., for the preparation of thin films with special electrical, magnetic or optical properties.
VIMATERIAL offers Nickel Niobium Alloy sputtering targets . Our targets are characterised by high purity, uniformity within the target, low impurities and high surface flatness. Our company can provide customers with target binding services, but also support the customisation of products and experiments, we have the most professional technical research and development team, contact us.
Molecular formula: NiNb
Molecular weight: about 151.6
Electronic field: used in the manufacture of electronic devices, can be deposited on the surface of the chip and other components of the thin film, to enhance the electrical conductivity and corrosion resistance of electronic components, thereby improving their performance and service life.
Semiconductor: In the semiconductor manufacturing process, thin films can be deposited to adjust the electrical properties of semiconductor materials, for example, to create metallisation layers, which helps to achieve smaller chip sizes and higher integration.
Optical field: The sputtering target can be used in optical lenses, coating, etc., to change the optical properties of the lenses by depositing a specific thickness of thin film, such as transmittance enhancement, reflection, etc., to meet the high-precision requirements of optical instruments.
Magnetic materials field: in the production of magnetic materials, can be deposited with special magnetic film, used to manufacture high-performance magnetic storage media or magnetic sensors, to enhance the magnetic properties of magnetic materials.
Aerospace: In the surface protection of aerospace equipment, NiNb sputtering targets can be used to deposit thin films to enhance the high temperature, wear and oxidation resistance of the material surfaces, and to ensure the reliability of aerospace equipment in extreme environments.
Each batch of products in the production process to implement a strict quality management system, we have strict inspection standards for incoming materials, non-conforming products have perfect treatment and isolation measures. We use high-precision testing instruments to ensure the quality of products leaving the factory, we can also provide samples according to customer requirements of the third-party inspection organisations, and ultimately make our products to meet customer requirements.
Nickel Niobium Alloy sputtering targets are packed in double vacuum bags and then boxed.
Nickel Niobium Alloy Nickel Niobium Alloy sputtering targets should be stored in a dry, clean, well-ventilated environment with relatively stable temperature and humidity to avoid moisture, oxidation, contamination with impurities, and physical impact damage, and should be isolated from corrosive chemicals.
VI HALBLEITERMATERIAL GmbH (VIMATERIAL) employs a stringent quality assurance system to ensure the reliability of our product quality. Strict quality control is implemented throughout the entire production chain, and for defective products, we strictly enforce the principle of rework and redo. Each batch is released only after passing detailed specification tests.
Every batch of our materials is independently tested, and, if necessary, we send samples to certified companies for testing. We provide these documents and analysis certificates with the shipment to certify that our products meet the required standards.
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