Catalogries

Chemical Name:
Neodymium (NIB) Magnet
Formula:
Nd2Fe14B
Product No.:
60260500
CAS No.:
EINECS No.:
Form:
Sputtering Target
HazMat:

MSDS

TDS

Product ID Formula Purity Dimension Quantity Price in € Inquiry
60260500ST001 Nd2Fe14B 99% (REO) Ø 76.2 mm x 3.175 mm 1 POR Inquire
60260500ST002 Nd2Fe14B 99% (REO) Ø 154.2 mm x 6.35 mm 1 POR Inquire
Product ID
60260500ST001
Formula
Nd2Fe14B
Purity
99% (REO)
Dimension
Ø 76.2 mm x 3.175 mm
Quantity
1
Price in €
POR
Product ID
60260500ST002
Formula
Nd2Fe14B
Purity
99% (REO)
Dimension
Ø 154.2 mm x 6.35 mm
Quantity
1
Price in €
POR

Neodymium (NIB) magnet sputtering targets are high-purity materials composed of neodymium, iron, and boron, used for depositing strong magnetic thin films in advanced applications such as data storage, sensors, and microelectronics.

Characteristics

Composition: Neodymium Iron Boron (NIB) magnet sputtering targets are composed of neodymium, iron, and boron, similar to NdFeB permanent magnets, known for their strong magnetic properties.

High Magnetic Strength: As a sputtering target, Neodymium (NIB) magnet retains the core characteristic of strong magnetic strength, which makes it ideal for thin film applications requiring magnetic properties.

Purity: These sputtering targets are typically produced with high purity levels (up to 99.9% or more) to ensure consistent performance in thin film deposition.

Physical Properties: Neodymium (NIB) magnet sputtering targets have high hardness and brittleness, which require precise handling and processing during deposition. The material’s magnetic properties make it suitable for applications needing high-performance magnetic films.

Thermal Sensitivity: Neodymium (NIB) magnet materials, including sputtering targets, are sensitive to temperature changes, with potential demagnetization occurring at elevated temperatures. However, for sputtering, they are often applied in controlled environments to avoid this issue.

Applications

Magnetic Thin Films: NdFeB sputtering targets are used to deposit magnetic thin films in industries such as data storage, sensor technologies, and microelectronic devices that require magnetic layers.

Hard Disk Drives (HDDs): These sputtering targets are used in the production of thin magnetic films for hard disk drives and other magnetic storage devices, enhancing storage capacity and performance.

Microelectromechanical Systems (MEMS): The magnetic films created from NdFeB targets are crucial for MEMS devices, which are used in sensors, actuators, and other precision electronics.

Magneto-Optical Devices: In applications that involve light manipulation using magnetic fields, such as magneto-optical data storage, NdFeB sputtering targets are used to create thin magnetic films.

Coating Permanent Magnets: These sputtering targets are also used to create protective or functional coatings on NdFeB permanent magnets, improving corrosion resistance and enhancing performance in harsh environments.

 

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QUALITY ASSURANCE

VI HALBLEITERMATERIAL GmbH (VIMATERIAL) employs a stringent quality assurance system to ensure the reliability of our product quality. Strict quality control is implemented throughout the entire production chain, and for defective products, we strictly enforce the principle of rework and redo. Each batch is released only after passing detailed specification tests.

Every batch of our materials is independently tested, and, if necessary, we send samples to certified companies for testing. We provide these documents and analysis certificates with the shipment to certify that our products meet the required standards.

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