Molybdenum Oxide

Molybdenum Oxide sputtering target is a sputtering target with specific physicochemical properties, which can be prepared by various methods and is widely used in various fields such as electronic device manufacturing and optical thin film preparation.

Properties

Chemical formula: MoO3

Appearance: usually white or light yellow lumpy or flaky solid, with certain hardness and brittleness.

Density: about 4.69 g/cm³.

Melting point and boiling point: melting point is about 795℃, boiling point is about 1155℃.

Chemical stability: Molybdenum oxide has good chemical stability at room temperature and pressure, but chemical reactions may occur under certain conditions such as high temperature, strong acids and alkalis. For example, it can be reduced with hydrogen to produce molybdenum metal at a certain temperature, and the corresponding molybdate can be produced when reacting with strong alkali solutions.

Oxidizing property: It has a certain oxidizing property and can be used as an oxidizing agent in some chemical reactions. This property needs to be considered and controlled according to the specific situation during its application.

Applications

Electronic device manufacturing: in semiconductor chip manufacturing, molybdenum oxide sputtering target can be used for the preparation of metal – oxide – semiconductor (MOS) devices in the gate oxide layer, its good insulation properties and stability to help improve the performance and reliability of the device; in addition, it can be used for the preparation of thin-film transistors (TFTs) in the transparent conductive oxide film, by adjusting the sputtering process parameters, you can achieve the film By adjusting the parameters of the sputtering process, the electrical and optical properties can be regulated to meet the needs of different applications.

Optical thin film preparation: Molybdenum oxide has a certain optical transmittance and refractive index, and can be used to prepare optical thin films such as optical interference filters, transmittance enhancement films, and high reflection films. In the optical coating process, by precisely controlling the thickness and refractive index of molybdenum oxide film, selective transmission, reflection or absorption of specific wavelengths of light can be realized, so as to achieve the effect of optical filtering, transmittance enhancement, etc., which is widely used in the fields of optical instruments, displays, and optical communications.

Energy storage and conversion: in the field of lithium-ion batteries, molybdenum oxide can be used as additives or coatings for electrode materials, which can improve the conductivity and structural stability of the electrode materials, thus improving the charging and discharging performance of the battery and the cycle life; in solar cells, molybdenum oxide film can be used as a window layer or a buffer layer, which can help to improve the photoelectric conversion efficiency and stability of the battery and has great significance in the promotion of the development of new energy technologies. It is of great significance to promote the development of new energy technology.

Display technology: In liquid crystal display (LCD) and organic light-emitting diode display (OLED) display technology, molybdenum oxide sputtering target can be used to prepare transparent conductive electrodes, pixel electrodes and other key components. Its good conductivity and transparency can meet the high performance requirements for electrode materials in display devices, and it plays an important role in improving display quality and reducing power consumption.