Magnesium oxide sputtering targets are materials used in physical vapor deposition (PVD) processes, primarily for creating MgO thin films in various applications, such as protective coatings, optical layers, and electronic devices. MgO targets are valued for their insulating properties, high melting point, and transparency in the visible and infrared ranges, making them suitable for applications requiring durable, high-quality films.
Chemical formula：MgO
Molar mass：40.304 g/mol
Appearance:White powder
Odor:Odorless
Density:3.6 g/cm3
Melting point:2,852 °C (5,166 °F; 3,125 K)
Boiling point:3,600 °C (6,510 °F; 3,870 K)
Solubility:Soluble in acid, ammonia insoluble in alcohol
Protective Coatings: MgO films are used as protective coatings for materials that operate at high temperatures or in corrosive environments, such as in aerospace components and optical lenses.
Optical and Transparent Films: Due to its optical transparency and ability to transmit infrared and visible light, MgO is used in optical coatings, display technologies, and anti-reflective films.
Microelectronics and Semiconductor Devices: Magnesium oxide sputtering targets are used as insulating layers or gate dielectrics in semiconductor devices. The high dielectric constant and insulating properties make MgO films suitable for applications in high-performance transistors and capacitors.
Magnetic Tunnel Junctions (MTJs): MgO is often used as a tunneling barrier layer in MTJs, which are key components in spintronic devices and magnetic random-access memory (MRAM) technology.
Biomedical Devices: Magnesium oxide sputtering targets are biocompatible and used as coatings in medical devices, including implants, where they serve as a corrosion-resistant and biocompatible barrier.
Brittleness: Magnesium oxide sputtering targets are brittle, which makes them susceptible to cracking or chipping during handling. Proper handling and careful mounting in sputtering systems are required to prevent damage.
Hygroscopic Nature: MgO can absorb moisture from the air, which may lead to partial hydration and affect sputtering performance. Storage and handling in dry conditions are essential to maintain target integrity.
Reactive Sputtering Environment: MgO may require a controlled sputtering environment to avoid unwanted reactions, especially in environments with high oxygen content. Reactive sputtering can also impact the deposition rate and film quality.
VI HALBLEITERMATERIAL GmbH (VIMATERIAL) employs a stringent quality assurance system to ensure the reliability of our product quality. Strict quality control is implemented throughout the entire production chain, and for defective products, we strictly enforce the principle of rework and redo. Each batch is released only after passing detailed specification tests.
Every batch of our materials is independently tested, and, if necessary, we send samples to certified companies for testing. We provide these documents and analysis certificates with the shipment to certify that our products meet the required standards.
Contact our team of experts today and let us help you with your business!
