Catalogries

Chemical Name:
Magnesium Oxide-doped Zinc Oxide
Formula:
ZnO:MgO
Product No.:
3008120800
CAS No.:
EINECS No.:
Form:
Sputtering Target
HazMat:

MSDS

TDS

Product ID Formula Purity Dimension Quantity Price in € Inquiry
3008120800ST001 ZnO:MgO 99.9% Ø 76.2 mm x 3.175 mm 1 286.00 Inquire
Product ID
3008120800ST001
Formula
ZnO:MgO
Purity
99.9%
Dimension
Ø 76.2 mm x 3.175 mm
Quantity
1
Price in €
286.00

Magnesium Oxide-doped Zinc Oxide sputtering target is a kind of Magnesium Oxide-doped Zinc Oxide sputtering target, which can be deposited on the substrate by sputtering process to form a thin film with specific properties, and it is widely used in the fields of electronic devices, optoelectronic devices, energy storage and so on.

The scale and size of Magnesium Oxide-doped Zinc Oxide sputtering target produced by VIMATERIAL can be customized according to customer’s requirements, our company is good at target binding, and we can do the binding service according to your requirements, our company has a professional technical team, if you need, please feel free to contact us.

Physical Properties

Molecular formula: ZnO:MgO

Appearance: Generally white or off-white target material.

Applications

Electronic devices: Magnesium Oxide-doped Zinc Oxide sputtering targets can be used for the preparation of electronic devices such as thin film transistors, utilizing its semiconductor properties and adjustable energy band structure to enhance the performance of the device.

Optoelectronic devices: The sputtering targets are suitable for the manufacture of optical coatings, transparent conductive films and other materials for optoelectronic devices due to their good transparency and excellent conductivity in the visible and ultraviolet spectral ranges.

Energy storage field: thin films with specific properties can be formed by sputtering process and applied to energy storage devices, which helps to improve the efficiency and stability of energy storage.

Semiconductor field: as a key material used in semiconductor chip manufacturing wafer fabrication and packaging and testing process of thin film deposition, the quality of which affects the chip’s transmission speed and stability.

Quality Control

Each batch of products will be inspected for composition, dimensions and other characteristics and an inspection report will be issued. Samples of each batch of products will be provided to the customer for re-inspection. Third party inspection is also available upon request.

Packaging and Storage

We use vacuum bag packing and reinforced protection inside a special box.

Magnesium Oxide – doped Zinc Oxide sputtering targets should be stored in a dry, cool, well-ventilated environment, avoiding moisture, oxidation, strong light and high temperature, and preventing contact with corrosive substances, and the packaging should be well sealed to ensure the stability of its physical and chemical properties.

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QUALITY ASSURANCE

VI HALBLEITERMATERIAL GmbH (VIMATERIAL) employs a stringent quality assurance system to ensure the reliability of our product quality. Strict quality control is implemented throughout the entire production chain, and for defective products, we strictly enforce the principle of rework and redo. Each batch is released only after passing detailed specification tests.

Every batch of our materials is independently tested, and, if necessary, we send samples to certified companies for testing. We provide these documents and analysis certificates with the shipment to certify that our products meet the required standards.

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