Catalogries

Chemical Name:
Magnesium Aluminate (Magnesium Aluminium Oxide)
Formula:
MgAl2O4
Product No.:
12130800
CAS No.:
12068-51-8
EINECS No.:
235-100-5
Form:
Sputtering Target
HazMat:

MSDS

TDS

Product ID Formula Purity Dimension Quantity Price in € Inquiry
12130800ST001 MgAl2O4 99.99% Ø 76.2mm x 3.175mm 1 POR Inquire
Product ID
12130800ST001
Formula
MgAl2O4
Purity
99.99%
Dimension
Ø 76.2mm x 3.175mm
Quantity
1
Price in €
POR

Magnesium aluminate sputtering target is a material used in the sputtering process to deposit thin films of magnesium aluminate (MgAl₂O₄) onto a substrate in various applications, such as semiconductor manufacturing, optics, and materials science.

Chemical Formula: MgAl₂O₄

Material Type: Sputtering targets are typically made of high-purity magnesium aluminate, which is in the form of a solid disc or cylindrical shape used in a vacuum chamber during the sputtering process.

Properties of Magnesium Aluminate Sputtering Targets

Composition and Purity: Magnesium aluminate sputtering targets are typically made from high-purity magnesium aluminate (MgAl₂O₄) to ensure that the deposited thin films are free from contaminants. The purity of the target is critical for producing high-quality films, especially in semiconductor and optical applications.

Thermal Stability: MgAl₂O₄ has excellent thermal stability, which makes it well-suited for sputtering at high temperatures. This property ensures that the sputtering process can be carried out without degrading the target or causing undesirable reactions.

Electrical Insulator: Magnesium aluminate is an electrical insulator, meaning it does not conduct electricity. This property is useful for certain applications where insulating films are required.

Hardness and Wear Resistance: Due to its hardness, magnesium aluminate is resistant to wear during the sputtering process, which contributes to the longevity of the sputtering target.

Crystalline Structure: MgAl₂O₄ crystallizes in the spinel structure, which can influence the properties of the sputtered films, such as their optical, mechanical, and electrical characteristics.

Applications of Magnesium Aluminate Sputtering Targets

Optical Coatings: Magnesium aluminate sputtering targets are used to create thin films for optical applications, including UV coatings, mirrors, and transparent coatings. MgAl₂O₄ has good UV transparency, making it suitable for applications requiring high transmission of ultraviolet light.

Semiconductor Manufacturing: Magnesium aluminate films are used in semiconductor devices, where they can serve as insulators or for specific electrical and thermal properties in devices like capacitors or transistors.

Ceramics and Abrasives: MgAl₂O₄ films are sometimes used in protective coatings or for wear-resistant applications due to the hardness of the material.

Catalysis: Magnesium aluminate sputtered thin films can be used as supports or catalysts in chemical reactions, particularly in processes like hydrogenation or catalytic cracking in the petroleum industry.

Magnetic and Magnetic Storage: The spinel structure of magnesium aluminate is also explored for magnetic applications, and sputtered films of MgAl₂O₄ can be used in magnetic storage devices.

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QUALITY ASSURANCE

VI HALBLEITERMATERIAL GmbH (VIMATERIAL) employs a stringent quality assurance system to ensure the reliability of our product quality. Strict quality control is implemented throughout the entire production chain, and for defective products, we strictly enforce the principle of rework and redo. Each batch is released only after passing detailed specification tests.

Every batch of our materials is independently tested, and, if necessary, we send samples to certified companies for testing. We provide these documents and analysis certificates with the shipment to certify that our products meet the required standards.

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