Lanthanum Iron Aluminum Oxide

Lanthanum Iron Aluminum Oxide sputtering targets are ceramic compound materials consisting of lanthanum, iron and aluminium used in coating techniques such as magnetron sputtering to prepare thin films with specific properties.

Characteristics

Chemical formula: LaFe(x)Al(1-x)O3;x=0.2

Elemental synergies: Lanthanum Iron Aluminum Oxide targets are made from a combination of lanthanum (La), iron (Fe), and aluminium (Al) elements, which gives the target unique physical and chemical properties. The addition of lanthanum may enhance the stability and special electrical and optical properties of the target; iron gives the target certain properties such as magnetism; aluminium helps to improve the hardness and oxidation resistance of the target.

Compositional homogeneity: High quality Lanthanum Iron Aluminum Oxide sputtering targets have good compositional homogeneity, which is very important for the uniform deposition of thin films during the sputtering process, and ensures that the properties of the prepared films are stable and consistent.

High melting and boiling points: Lanthanum Iron Aluminum Oxide targets have high melting and boiling points, which enable them to withstand high energy inputs during the sputtering process without melting or volatilisation, thus ensuring the stability of the sputtering process and the service life of the targets.

Good electrical and thermal conductivity: Although it is an oxide ceramic target, it still has a certain degree of electrical and thermal conductivity, which is conducive to the transmission of charge and energy distribution in the sputtering process, and can improve the sputtering efficiency and film quality.

Higher hardness: The presence of aluminium makes the target material have higher hardness, which can resist the bombardment of ions during the sputtering process and reduce the abrasion and deformation of the target material, thus ensuring the dimensional stability and service life of the target material.

Uniformity of grain size: Lanthanum Iron Aluminum Oxide targets have uniform grain size, which helps to improve the sputtering rate and directionality of atoms during the sputtering process, resulting in uniform, dense films.

Low porosity: Lanthanum Iron Aluminum Oxide targets have low porosity, which reduces gas adsorption and residue during sputtering and improves film purity and quality.

Applications

Semiconductor devices: Lanthanum Iron Aluminum Oxide targets can be used to prepare thin films for semiconductor devices, such as insulating layers, buffer layers, or electrode materials in the manufacturing process of integrated circuits, which helps to improve the performance and reliability of semiconductor devices. For example, in the manufacture of some field effect transistors, the thin film formed by sputtering of this target can be used as a gate insulating layer to improve the switching performance of the transistor.

Magnetic storage equipment: As the Lanthanum Iron Aluminum Oxide target contains iron, it has a certain degree of magnetism, and can be used in magnetic storage equipment, such as hard discs, magnetic tapes, etc., magnetic film preparation, which can improve the storage density and read/write speed of magnetic storage equipment.
Electronic component electrode: in some electronic components, such as capacitors, resistors, etc., can be used to prepare electrode materials, its good conductivity and stability can improve the performance of electronic components.

Optical film: it can be used to prepare optical films, such as anti-reflection film, transmittance enhancement film and so on. These optical films can be applied to optical lenses, eyeglass lenses, displays and other optical devices to improve the optical performance of optical devices, such as reducing reflection, increasing transmittance and so on.

Laser Materials: In the field of laser materials, this sputtering target can be used as doping materials or auxiliary materials for the preparation of laser crystals, to improve the performance of laser crystals, which can be applied to the manufacture of lasers.

Solar cell: in the manufacture of solar cells, it can be used to prepare electrode materials or light absorbing layer materials for solar cells to improve the photoelectric conversion efficiency of solar cells.

Fuel Cell: In fuel cells, the target can be used as a catalyst or catalyst carrier material to promote the reaction of the fuel cell and improve the performance and efficiency of the fuel cell.

Sensors: it can be used to prepare sensitive materials for various sensors, such as gas sensors and temperature sensors. Due to its special composition and structure, it has a sensitive response to changes in certain gases or temperatures, and is able to convert changes in these physical quantities into electrical signals to achieve the detection of gases or temperatures.

Coating materials: As the sputtering target has good wear resistance, corrosion resistance and high temperature resistance, it can be used to prepare a variety of coating materials, such as tool coatings, mould coatings, etc., which can improve the service life and performance of tools and moulds.