Lanthanum Boride

Lanthanum Boride sputtering target is a boride ceramic sputtering target composed of lanthanum (La) and boron (B) with high purity and a wide range of shapes and sizes for semiconductors, chemical vapour deposition (CVD), physical vapour deposition (PVD), displays, optics and other applications. It has high melting point, good thermal stability, low fugitive work, and high hardness, which enables the formation of uniform, high-quality thin films during the sputtering process.

Characteristics

High melting point, high strength and high hardness: this enables it to withstand the bombardment of the ion beam during sputtering without being easily deformed or damaged, ensuring the stability and uniformity of the sputtered coating, and allowing for long and stable sputtering operations.

Low Coefficient of Expansion: Lanthanum Boride has a coefficient of expansion close to 0 over a range of temperatures, which means that the material’s dimensions change very little when the temperature changes, which is important for applications that require precise control of film thickness and properties.

Good electrical and thermal conductivity: The free electrons in the structure of Lanthanum Boride give it good electrical and thermal conductivity similar to that of metals, enabling efficient transfer of electric current and heat, which is positive for energy transfer during sputtering and uniform deposition of thin films.

High chemical stability: Lanthanum Boride only reacts with aqua regia and nitric acid at room temperature, and has a low degree of oxidation between 600℃ and 900℃, which makes the chemical composition of the material not easy to change during the sputtering process, and ensures the purity and quality of the coating.

Excellent resistance to radioactivity: Lanthanum Boride has good resistance to radioactivity, which is an advantage in applications involving radioactive environments or where radiation resistance is required.

Applications

Semiconductor field: It can be used in the manufacture of semiconductor devices, such as the deposition of conductive films or other functional films on semiconductor chips, which helps to improve the performance and reliability of semiconductor devices. For example, it is applied to semiconductor circuits as electrode materials or thin film resistive materials.

Flat panel display field: It is used to prepare various films in flat panel displays, such as transparent conductive films, which can improve the performance of displays such as brightness, contrast and response speed.

Optical Coating: It can be used to manufacture coating of optical lenses, such as transmittance enhancement film, reflective film, etc. It can reduce the reflection and scattering of light, and improve the transmittance and imaging quality of optical lenses. In laser optical system, the thin film prepared by Lanthanum Boride sputtering target can be used in laser reflectors, lenses and other optical components to improve their optical performance.

Thermal cathode materials: With low electron escape work and good thermal stability, they can be used as thermal cathode materials in electron guns, cathode ray tubes, plasma generators and other equipment, capable of emitting a large number of electrons at a low temperature.

Solar energy field: with heat-absorbing properties and being a thermo-ionic material, it can be used as a direct high-temperature solar absorber and an electron source, which has potential for application in future concentrating solar thermal-electronic systems, and is capable of reducing the complexity of the system and realising innovations.

Other fields: It can also be applied to the preparation of wear-resistant materials, high-temperature corrosion-resistant materials, etc., using its high hardness, high melting point and good chemical stability and other characteristics to improve the wear resistance and corrosion resistance of the material. In the field of high-grade decorative items, thin films with special optical effects and decorative properties can also be prepared on the surface of products by sputtering coating technology, increasing the aesthetics and added value of the products.