Lanthanum Aluminum Oxide wafer is a lanthanum aluminium oxide-based wafer with good chemical stability, high purity, and homogeneous structure, which can be used in semiconductor devices, optical components, electronic devices, and other fields, as a substrate or functional thin film material to achieve a variety of functions, such as insulation, conduction, and optics.
Characteristics
High hardness: the hardness reaches 6.5 Moh’s hardness, which gives it good mechanical stability and wear resistance, and it is not easy to be scratched or damaged during processing and use, and it can maintain good surface flatness and precision.
High density: density of 6.52g/cm³, higher density helps to improve the stability of the material and the ability to resist interference, so that in a variety of complex environmental conditions can maintain better performance.
High melting point: The melting point is up to 2080°C, which means that Lanthanum Aluminum Oxide wafers can still maintain stable structure and performance under high temperature environments, making them suitable for high-temperature related application scenarios.
Good chemical stability: At room temperature, Lanthanum Aluminum Oxide wafers do not react with most chemicals and have good corrosion resistance, enabling them to be used in a variety of chemical environments.
Low solubility: Insoluble in water and common mineral acids at 25°C, which gives it an advantage for applications in aqueous or acidic environments, where its properties and structure will not be affected by dissolution.
Optical transparency: Lanthanum Aluminum Oxide wafer is an optically transparent ceramic oxide with good light transmission in a certain wavelength range, which makes it useful for a wide range of applications in optics, such as optical windows and lenses.
Specific colour and appearance: Lanthanum Aluminum Oxide wafers present an appearance ranging from transparent to brown, depending on the annealing conditions, and this colour change characteristic allows for a variety of options for different application needs.
Low dielectric constant: low dielectric constant, which makes it has good application prospects in high frequency circuits and microwave devices, can reduce the energy loss and signal interference during signal transmission.
Low microwave loss: In the microwave frequency range, it has low loss, which makes it suitable for use in microwave devices and RF circuits, such as microwave filters and antennas.
Crystal structure properties: Lanthanum Aluminum Oxide wafer has a twisted chalcogenide structure, which makes it a good lattice match for many materials with chalcogenide structure, providing a basis for its application in heterostructure and thin film growth.
Applications
Semiconductor field: As a high-quality substrate material, it is used for epitaxial growth of various semiconductor thin films, such as superconducting, magnetic and ferroelectric films with chalcogenide structure. It can provide good lattice matching and chemical stability for the growth of thin films, which helps to improve the quality and performance of thin films.
Optical field: Due to its optical transparency and good optical performance, it can be used to manufacture optical windows, lenses, prisms and other optical components, and has a wide range of applications in laser systems, optical communications, optical sensors and other fields.
Electronic device field: due to its low dielectric constant and low microwave loss characteristics, it is used in high frequency electronic devices and microwave devices, such as high frequency capacitors, microwave filters, antennas, etc., which can improve the performance of the device and the operating frequency.
Biomaterials field: In the biomedical field, Lanthanum Aluminum Oxide wafer can be used as a substrate material for biosensors or as a coating for biocompatible materials for the detection and analysis of biomolecules, as well as surface modification of implantable medical devices.
High-temperature materials field: With its high melting point and good chemical stability, it can be used as sensors and catalyst carriers in high-temperature environments, and has potential applications in high-temperature industrial processes and energy fields.
VI HALBLEITERMATERIAL GmbH (VIMATERIAL) employs a stringent quality assurance system to ensure the reliability of our product quality. Strict quality control is implemented throughout the entire production chain, and for defective products, we strictly enforce the principle of rework and redo. Each batch is released only after passing detailed specification tests.
Every batch of our materials is independently tested, and, if necessary, we send samples to certified companies for testing. We provide these documents and analysis certificates with the shipment to certify that our products meet the required standards.
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