Iridium metal

Iridium metal sputtering target is an iridium metal as the main component, used in magnetron sputtering and other coating technology, can be in the semiconductor, optics, electronics and many other fields to prepare high-performance thin films of the key materials.

Characteristic

Density: Iridium has a high density of about 22.56g/cm³ at room temperature, which makes the sputtering target have a high quality and stability, and can maintain a good shape and positional accuracy during the sputtering process.

Melting point: With a melting point of 2446°C, it is a high melting point metal. The high melting point ensures that the sputtering target can withstand high energy input during the sputtering process and is not easy to melt or deform, thus ensuring the quality and uniformity of the sputtered film.

Hardness: Higher hardness and higher brittleness at room temperature, but brittleness turns to toughness at higher temperatures. Higher hardness makes the sputtering target have better wear resistance and scratch resistance, and can maintain the flatness and finish of the surface during a long sputtering process.

Electrical Conductivity: Good electrical conductivity with a resistivity of 4.71 Ω/m. Good electrical conductivity contributes to the formation of a stable plasma during the sputtering process, which improves the sputtering efficiency and the deposition rate of the film.

Coefficient of Thermal Expansion (CTE): It is a thermal expansion property that increases in volume with increasing temperature and decreases in volume with decreasing temperature. In the sputtering process, it is necessary to consider the effect of the coefficient of thermal expansion on the size and properties of the target material to ensure the quality and stability of the sputtered film.

Reflectivity: It has a high reflectivity for visible light and a metallic lustre on its surface. This property makes iridium sputtering targets useful in optical applications, such as the preparation of optical films and mirrors.

Chemical inertness: Iridium metal has strong chemical inertness, corrosion resistance and oxidation resistance. It is insoluble in water, nitric acid, sulphuric acid, hydrochloric acid, aqua regia and other solvents, but in the presence of strong oxidising agents (e.g. sodium perchlorate) and when heated to about 120°C, it can be dissolved in hydrochloric acid solution. This chemical inertness allows iridium sputtering targets to maintain stable performance in a variety of complex chemical environments and is suitable for a wide range of different sputtering processes and application scenarios.

Valence: Iridium has a variety of valence states, mainly +3 and +4. This enables iridium to form a wide range of compounds and complexes with other elements, thus expanding its applications in materials science and chemistry.

Crystal structure properties: Iridium is a cubic centred structure with the space group cubic fm-3m (space group number: 225) and the cell parameters a=b=c=3.8312, α=β=γ=90°. However, the actual iridium crystals are not perfect, and usually have certain defects which affect the mechanical strength, electrical conductivity and other properties of the crystal.

Isotopic properties: Iridium has two naturally occurring stable isotopes, ¹⁹¹Ir and ¹⁹³Ir, with natural abundances of 37.3% and 62.7%, respectively. In addition, there are more than 40 isotopes of iridium with mass numbers ranging from 163 to 205, some of which have industrial or medical applications.

Applications

Semiconductor field:
Integrated Circuit Manufacturing: Iridium sputtering targets are used to prepare thin-film structures such as metallic interconnects and barrier layers in the manufacture of semiconductor chips. Due to its high melting point, high hardness, good electrical conductivity and chemical stability, iridium is able to meet the stringent requirements for materials in the semiconductor manufacturing process, ensuring chip performance and reliability. For example, in advanced nanoscale chip manufacturing processes, iridium metal films can be used as a barrier layer to prevent the diffusion of metal ions, ensuring the stability of circuits and the accuracy of signal transmission.

Semiconductor device encapsulation: In the encapsulation of semiconductor devices, iridium metal targets can be used to make coatings for encapsulation materials to improve the sealing, electrical conductivity and heat resistance of the package and to protect the chip from the external environment.

Optical field:
Optical film preparation: Iridium metal can be used to make a variety of optical films, such as anti-reflective film, high reflective film, filter film and so on. Iridium’s high reflectivity and good optical stability make it an important application in the field of optical films. For example, in lasers, optical sensors, telescopes and other optical equipment, the use of iridium metal sputtering targets prepared optical films can improve the optical performance and stability of the equipment.

Flat panel display: In flat panel display technology, such as liquid crystal displays (LCD), organic light-emitting diodes (OLED), etc., iridium metal sputtering targets can be used for the preparation of transparent conductive films, electrode materials and so on. Iridium’s good conductivity and optical transparency can meet the requirements of flat panel display on the material, improve the brightness, contrast and response speed of the display.

New energy field:
Solar cells: In the manufacture of solar cells, iridium metal sputtering targets can be used to prepare the electrodes, reflective layer and other components of solar cells. Iridium’s high conductivity and good corrosion resistance can improve the conversion efficiency and stability of solar cells, reduce the battery resistance and energy loss.

Fuel Cell: Fuel cell is an efficient and clean energy conversion device, iridium metal sputtering target can be used to prepare the catalyst layer of fuel cell. Iridium catalyst has good catalytic activity and stability, which can improve the performance and life of fuel cells.

Aerospace field:
High-temperature coatings: Aerospace equipment operates in extreme environments such as high temperature, high pressure and high speed, requiring the use of high-performance coating materials to protect equipment components. Iridium sputtering targets can be used to prepare high-temperature antioxidant coatings, thermal barrier coatings, etc., to improve the high-temperature resistance and corrosion resistance of equipment components and extend the service life of the equipment.

Aero-engine components: In the manufacture of aero-engine, iridium sputtering targets can be used to prepare coatings for engine blades, combustion chambers and other components. These coatings can improve the high temperature resistance, abrasion resistance and corrosion resistance of engine components, and improve the efficiency and reliability of the engine.

Biomedical field: in the biomedical field, iridium metal sputtering targets can be used to prepare coatings for medical devices, such as artificial joints and pacemakers. The biocompatibility and corrosion resistance of iridium can improve the service life and safety of medical devices.

Decoration field: Because iridium metal has unique metallic luster and chemical stability, it can be used to make high-grade decorations, such as jewellery and watches. Iridium sputtering targets can provide high-quality coatings for decorative items, increasing their aesthetics and durability.