Indium Zinc Alloy

Indium Zinc Alloy sputtering target is a material mainly made of indium zinc alloy for physical vapour deposition technology, which can release indium and zinc atoms during the sputtering process, and deposit a thin film of indium zinc alloy on the substrate, which is widely used in electronics, optics and many other fields.

Characteristics

Density: Density varies depending on the ratio of indium to zinc. Indium has a density of approximately 7.31g/cm³ and zinc has a density of approximately 7.14g/cm³, so the density of indium-zinc alloys is somewhere in between, and its value has a significant impact on the weight of the target, mounting and stability during sputtering.

Melting point: The melting point is lower than that of pure indium and pure zinc. The melting point of indium is 156.61°C and that of zinc is 419.5°C. The low melting point of the alloy makes it easier for it to be vaporised during sputtering, thus facilitating the deposition of the film on the substrate. However, attention needs to be paid to the temperature control during storage and transportation in order to avoid melting and deformation of the target.

Appearance: Usually showing a silver-grey metallic luster, the uniformity and finish of the appearance has a certain impact on the sputtering effect and the quality of the film. Good appearance can ensure the uniform emission of atoms during the sputtering process, thus obtaining high quality films.

Oxidation and corrosion resistance: To a certain extent, they have oxidation and corrosion resistance properties, but oxidation and corrosion reactions may still occur in certain specific environments. In the process of storage and use, it is necessary to avoid the exposure of the target material to humidity, high temperature, strong acid and alkali and other harsh environments, in order to prevent the surface of the target material from being oxidised or corroded, which will affect its sputtering performance.

Conductivity: good electrical conductivity, this is because indium and zinc itself are both metals with good electrical conductivity. Good conductivity makes it easier for electrons to travel through the target during sputtering, thus improving sputtering efficiency and film quality. For example, sputtering targets with good electrical conductivity are required for the preparation of conductive films in the manufacture of electronic devices.

Resistance: The relatively low resistance value facilitates the passage of current, reduces energy losses and improves the energy efficiency of the sputtering process. Low resistance characteristics are important for mass production and reducing production costs.

Applications

Semiconductor field:

Integrated Circuit Manufacturing: In the manufacturing process of semiconductor chips, indium zinc alloy sputtering targets can be used to prepare a variety of thin films, such as conductive layers and barrier layers. For example, in the manufacture of transistors, it is used to form structures such as electrodes and interconnecting lines, which play an important role in the performance and integration of the chip. Its good conductivity and stability can meet the high requirements of semiconductor devices on film materials.

Semiconductor encapsulation: In the encapsulation segment, it can be used to make thin film coatings of encapsulation materials to improve the reliability and performance of the encapsulation, such as to play a role in moisture-proof, corrosion-proof, conductive connection, and so on.

Flat panel display field:

Liquid Crystal Display (LCD): used in the preparation of transparent conductive films in liquid crystal display panels. Indium zinc alloy target sputtering formed by the film has good conductivity and light transmission, can be used as the electrode material for liquid crystal displays, such as common thin film transistor (TFT) liquid crystal display in the transparent electrode.

Organic Light Emitting Diode (OLED): In OLED display panels, it can be used to prepare conductive films for anode or cathode, as well as auxiliary electrodes for the light-emitting layer. It helps to improve the luminous efficiency, stability and life of OLED.

Solar Cells: In the manufacture of solar cells, indium zinc alloy sputtering targets can be used to prepare key components such as electrodes and absorber layers for thin-film solar cells. For example, in copper indium gallium selenide (CIGS) thin-film solar cells, it can be used as a substitute or auxiliary material for some elements to improve the photoelectric conversion efficiency and stability of the cells.

Optical coating field: can be used to manufacture optical lenses, optical lenses and other optical components of the thin film coating. For example, it is used to prepare anti-reflection film, transmittance enhancement film, etc., to reduce the reflection loss of optical elements and improve optical performance and imaging quality.

Electronic device field: It can be used to prepare conductive film and insulating film in electronic devices. For example, it is used as a sputtering source for electrode or dielectric materials in electronic components such as thin film resistors and thin film capacitors to improve the performance and reliability of electronic devices.