Indium Tin Alloy

Indium Tin Alloy sputtering target is a kind of indium tin alloy as the main component of the target, with good electrical conductivity, low melting point and high purity, etc. In the process of physical vapour deposition, it can be used for the preparation of a variety of functional thin films, such as transparent conductive films, and it is a key material for the preparation of thin films in many fields, such as electronics, optics and so on.

Characteristics

Chemical formula: InSn

Composition ratio: The ratio of indium (In) and tin (Sn) in indium-tin alloy sputtering targets can be adjusted according to the specific needs of the application, and different ratios will affect the performance of the target.

Density: Indium has a density of 7.31 g/cm³ and tin has a density of 7.28 g/cm³, so the density of Indium-Tin alloys varies according to the ratio of the two. Higher density helps to improve the sputtering efficiency of the target and the uniformity of the film.

Hardness: Indium itself is a soft metal, and tin has a relatively low hardness, so Indium-Tin alloys are usually not very hard.

Thin film properties: Thin films prepared using indium-tin sputtering targets have good conductivity, light transmission and stability. For example, ITO films have a wide range of applications in flat panel displays, touchscreens, solar cells and other fields.

Applications

Flat panel display field:

Liquid Crystal Display (LCD): In the manufacture of LCD, indium tin alloy sputtering targets are used to form transparent conductive films, such as indium tin oxide (ITO) films, on glass substrates through the sputtering process. This film has good electrical conductivity and light transmittance, and can be used as an electrode material to control the arrangement of liquid crystal molecules, thus realising the display of images. For example, ITO targets are used in the production of screens for smartphones, tablet PCs, TVs and other liquid crystal display devices.

Organic Light Emitting Diode (OLED) displays: Although the light-emitting principle of OLED displays is different from that of LCDs, indium-tin alloy sputtering targets are also used in the preparation of electrodes or other functional films in some OLED display devices to improve the performance and stability of the devices.

Semiconductor field:

Integrated Circuit Manufacturing: Indium tin alloy sputtering targets are used to prepare thin film structures such as metal interconnections and barrier layers during the manufacturing process of semiconductor chips. These films play a key role in the connection of circuits and signal transmission inside the chip, and can improve the integration and performance of the chip.

Semiconductor packaging: In semiconductor packaging, indium tin alloy sputtering targets can be used to make conductive or barrier layers for packaging materials, improving the electrical performance and reliability of the package.

Solar Cells: Indium tin alloy sputtering targets can be used to prepare transparent conductive oxide (TCO) films for use as front or back electrodes in the production of solar cells. This film can improve the photoelectric conversion efficiency of solar cells, and has good conductivity and light transmission, which helps to improve the performance of solar cells.

Touch screen field: As an input device, touch screen is widely used in smart phones, tablet PCs, e-readers and other electronic devices. Indium tin alloy sputtering target is used to manufacture conductive film for touch screen, which enables the touch screen to sense the touch operation of fingers and realise human-machine interaction.

Optical Coating: In the surface coating of optical lenses, optical windows and other optical components, indium tin alloy sputtering targets can be used to prepare films with specific optical properties, such as anti-reflective films and transparency enhancement films. These films can reduce the reflection on the surface of optical elements and improve the transmittance and optical performance of optical elements.