Chemical formula: composed of two elements, hafnium (Hf) and silicon (Si), with an atomic ratio of 1:2.
Molecular weight: 234.61.
Crystal structure: HfSi₂ has a tetragonal crystal structure, which gives the atoms a regular and ordered arrangement in space.
Appearance and morphology: HfSi₂ powder is generally grey or off-white.
Density: 9.56 g/cm³, which gives it an advantage in applications where weight and stability are important.
Melting point: Approximately between 1800 – 1900°C, which indicates that it is able to remain solid and maintain its basic structure at high temperatures.
Electronic materials field: Hafnium Silicide, as a semiconductor material, is used in the manufacture of various electronic components in integrated circuits, such as field effect transistors, resistors and capacitors.
High temperature materials: Due to its high melting point and good thermal stability, HfSi₂ can be used in the manufacture of high temperature structural ceramics. In high temperature equipment in aerospace, metallurgy, energy and other fields, HfSi₂ is used as high temperature structural components or thermal barrier coating materials.
Ceramic materials field: HfSi₂ can be compounded with other ceramic materials to form ceramic composites with special properties.
VI HALBLEITERMATERIAL GmbH (VIMATERIAL) employs a stringent quality assurance system to ensure the reliability of our product quality. Strict quality control is implemented throughout the entire production chain, and for defective products, we strictly enforce the principle of rework and redo. Each batch is released only after passing detailed specification tests.
Every batch of our materials is independently tested, and, if necessary, we send samples to certified companies for testing. We provide these documents and analysis certificates with the shipment to certify that our products meet the required standards.
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