Hafnium Oxide particles are granular substances composed of hafnium and oxygen, usually white or light yellow in colour, with high melting points, high dielectric constants, good chemical stability and optical properties, which play an important role in semiconductors, optics, ceramics and many other fields.
Characteristics
Appearance: usually white powder.
Density: Relatively high density, about 9.68g/cm³, in the oxide ceramic materials belong to the higher density category.
Melting point: melting point up to 2182 ℃, with a high thermal stability, able to maintain stability in high-temperature environments.
Hardness: Higher hardness gives it good abrasion and scratch resistance and can be used in applications such as wear-resistant coatings.
Chemical formula: HfO₂, relatively stable chemically, insoluble in water, hydrochloric acid and nitric acid, but soluble in concentrated sulphuric acid and hydrofluoric acid.
Stability: It is relatively stable at room temperature and pressure, and is not easy to have chemical reactions with other substances, but under special conditions such as high temperature, strong acid or strong alkali, certain chemical reactions may occur.
Optical properties: good optical properties, high transmittance in a certain wavelength range, transmittance range of about 220 ~ 12000nm, refractive index at different wavelengths, for example, in the 250nm when the refractive index of about 2.15, 500nm when about 2.
Electrical Characteristics: It has high dielectric constant, which makes it potentially valuable in the semiconductor field, and can be used for the preparation of films with high dielectric constant, such as in the gate dielectric and other applications.
Particle size characteristics: particle size can vary depending on the preparation method and process, commonly nanoscale particles and micron-sized particles. Hafnium oxide nanoparticles are usually between tens and hundreds of nanometres in size and have a large specific surface area and high surface activity, while micron-sized particles have a particle size of more than 1 micron.
Applications
Semiconductor field:
Gate dielectrics: Due to its high dielectric constant, hafnium oxide can be used to make gate dielectric layers in semiconductor devices, enabling higher capacitance at smaller physical dimensions and thus improving transistor performance and integration. In advanced complementary metal oxide semiconductor (CMOS) technology, for example, hafnium oxide particles are used to prepare high-quality gate dielectric films.
Memory devices: ferroelectricity, which means that data can be stored for long periods of time even in the absence of a power supply, can be applied to non-volatile memory devices, such as ferroelectric random access memory (FeRAM), etc., and offers the possibility of developing new storage technologies.
Blocking Layer: In the semiconductor manufacturing process, it can be used as a diffusion blocking layer to prevent the diffusion of metal ions and other impurities between different material layers, ensuring the performance and reliability of semiconductor devices.
Optical field:
Optical films: With a high refractive index (about 2.0) and a small absorption coefficient in the ultraviolet to infrared wavelength range, they are suitable for the preparation of a variety of optical films, such as transmittance-enhancing films, high-reflective films, and anti-reflective films. These optical films can be used in optical lenses, lasers, solar cells and other optical devices to improve their optical properties.
Optical waveguide: It can be used as an optical waveguide material for guiding and transmitting optical signals. In integrated optical systems, optical waveguides made of hafnium oxide particles have the advantages of low loss and high stability, which are important for the realisation of optical communications and optical information processing.
Catalyst field:
Hydrogen Fuel Cell Catalyst: Hafnium oxide after special treatment can be a highly active catalyst that can withstand strong acids, and has the potential to be used as a substitute for hydrogen fuel cell catalysts, reducing the cost of fuel cells, and can also be used in the field of electrochemical water decomposition for hydrogen production.
High temperature materials field:
High-temperature coatings: Because hafnium oxide has a high melting point (about 2758 ℃) and good thermal stability, it can be used as a high-temperature coating material applied to the surface of equipment and components in high-temperature environments such as aerospace, metallurgy, etc., to play a role in heat insulation, oxidation, wear and other protection.
Ceramic materials: can be used to prepare high-performance ceramic materials, such as hafnium oxide ceramics with good mechanical strength, hardness and high temperature resistance, can be applied to high-temperature structural components, wear-resistant parts.
Ultrasonic transducer field:
Matching layer material: in high-frequency ultrasonic transducers, hafnium oxide particles can be used to make a matching layer, so that the acoustic impedance of the transducer element matches the acoustic impedance of the lens focusing on the resulting ultrasonic signal, improving the conversion efficiency and performance of the ultrasonic transducer.
VI HALBLEITERMATERIAL GmbH (VIMATERIAL) employs a stringent quality assurance system to ensure the reliability of our product quality. Strict quality control is implemented throughout the entire production chain, and for defective products, we strictly enforce the principle of rework and redo. Each batch is released only after passing detailed specification tests.
Every batch of our materials is independently tested, and, if necessary, we send samples to certified companies for testing. We provide these documents and analysis certificates with the shipment to certify that our products meet the required standards.
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