Hafnium nitride sputtering target is a kind of key component made of hafnium nitride material and used in sputtering deposition technology to prepare high-performance thin films, which has a wide range of applications in semiconductors, optics, electronics and other high-tech fields with high hardness, high melting point, good chemical stability and other characteristics, which plays an important role in improving the performance and quality of related products.
Characteristics
Purity: general purity can reach 99.5% and above, high purity hafnium nitride can ensure the quality and performance of sputtered films, reduce the impact of impurities on film properties.
Colour and Appearance: Usually appears as a yellowish brown crystalline solid.
Melting point: up to 3305°C, the high melting point enables it to withstand high energy input during sputtering without melting and deformation, ensuring the stability and service life of the target.
Density: Theoretical density is about 13.8 g/cm³, high density helps to improve sputtering efficiency and film uniformity.
Resistivity: The resistivity of hafnium nitride films changes with the nitrogen content during sputtering, for example, when the nitrogen content changes, the resistivity can change by more than 8 orders of magnitude, which is important for controlling the electrical properties of sputtered films.
Refractive index: The refractive index is relatively stable within a certain range of nitrogen content, e.g. at low nitrogen content, the refractive index is almost constant at 2.8 (1 – 0.3i), but with further increase of nitrogen content, the refractive index changes, which is very critical for the preparation of optical thin films and the control of their properties.
Applications
Semiconductor field:
Thin film deposition: In the semiconductor manufacturing process, it is used in thin film deposition process to form conductive layer, barrier layer, etc.. For example, in the manufacture of integrated circuits, hafnium nitride thin film can be used as a high-performance conductive or barrier material, which helps to improve the performance and integration of the chip. Its high melting point, high hardness and good chemical stability can ensure that the quality and performance of the film is stable under the harsh environment of high temperature and high energy in semiconductor manufacturing.
Gate dielectric: It can be used as a gate dielectric material in semiconductor devices such as field effect transistors (FETs). Hafnium nitride has a high dielectric constant and can achieve high capacitance in a small physical size, which helps to improve the performance and integration of semiconductor devices, and is important for promoting the miniaturisation and high performance of semiconductor devices.
Optical field:
Optical coatings: can be used to prepare optical films, such as anti-reflective coatings and high reflective coatings. In camera lenses, optical lenses, solar receivers and other optical devices, hafnium nitride films can improve the performance and efficiency of optical devices by regulating the reflection and refraction of light. For example, in solar receivers, highly reflective hafnium nitride films can improve the efficiency of solar energy absorption; in camera lenses, anti-reflective hafnium nitride films can reduce the reflection of light and improve imaging quality.
Display technology: In flat panel displays, LEDs and other display technologies, hafnium nitride sputtering targets can be used to prepare functional thin films such as transparent conductive films and electrode materials. These films play an important role in improving the brightness, contrast, response speed and other properties of display devices.
Wear-resistant and protective coating field:
Tool coating: due to the high hardness and good wear resistance of hafnium nitride, it can be used as a coating material for tools such as cutting tools and moulds to improve the service life and cutting performance of tools. For example, in cutting, tools coated with a hafnium nitride film can reduce wear and improve machining efficiency and machining quality.
Protective coatings: In aerospace, automotive, machinery and other fields, can be used to prepare protective coatings to protect parts from wear and tear, corrosion and high temperatures and other harsh environments. For example, in the parts of the aircraft engine, hafnium nitride coating can improve the parts of high temperature and corrosion resistance, to ensure the normal operation of the engine.
Photovoltaic field: in the preparation of thin-film solar cells, hafnium nitride sputtering target can be used for the preparation of electrodes, absorber layer and other key components of the film. Its good electrical properties and stability can improve the photoelectric conversion efficiency and stability of solar cells.
Glass coating field: it can be used in the coating of automotive glass, architectural glass, etc., giving the glass special properties, such as heat insulation, UV protection, low radiation, etc.. For example, coated with hafnium nitride film on automotive glass can reduce heat absorption inside the car and lower the energy consumption of air conditioning; coated on architectural glass can improve the energy efficiency of buildings.
VI HALBLEITERMATERIAL GmbH (VIMATERIAL) employs a stringent quality assurance system to ensure the reliability of our product quality. Strict quality control is implemented throughout the entire production chain, and for defective products, we strictly enforce the principle of rework and redo. Each batch is released only after passing detailed specification tests.
Every batch of our materials is independently tested, and, if necessary, we send samples to certified companies for testing. We provide these documents and analysis certificates with the shipment to certify that our products meet the required standards.
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