| Product ID | Formula | Purity | Dimension | Quantity | Price in € | Inquiry |
|---|---|---|---|---|---|---|
| 7200ST001 | Hf | 99.9% (Zr< 2%) | Ø 25.4 mm x 3.175 mm | 1 | 158.00 | Inquire |
| 7200ST002 | Hf | 99.9% (Zr< 2%) | Ø 50.8 mm x 3.175 mm | 1 | 566.00 | Inquire |
| 7200ST003 | Hf | 99.9% (Zr< 2%) | Ø 76.2 mm x 3.175 mm | 1 | 1,001.00 | Inquire |
| 7200ST004 | Hf | 99.9% (Zr< 2%) | Ø 25.4 mm x 6.35 mm | 1 | 257.00 | Inquire |
| 7200ST005 | Hf | 99.9% (Zr< 2%) | Ø 50.8 mm x 6.35 mm | 1 | 898.00 | Inquire |
| 7200ST006 | Hf | 99.9% (Zr< 2%) | Ø 76.2 mm x 6.35 mm | 1 | 1,709.00 | Inquire |
| 7200ST007 | Hf | 99.9% (Zr< 2%) | Ø 101.6 mm x 6.35 mm | 1 | 2,826.00 | Inquire |
Hafnium metal sputtering target is a material for physical vapour deposition with hafnium metal as the main component, usually in a specific shape, with high purity, good electrical conductivity and thermal stability, it is a key material for the preparation of hafnium thin films, which play an important role in semiconductor, aerospace, nuclear industry and many other fields.
Characteristics
Atomic number: 72
Atomic weight: 178.49
Appearance: steel grey, with a metallic luster
Melting point: up to 2,227°C, which makes it stable under high temperature environment and suitable for some processes requiring high temperature sputtering coating.
Thermal conductivity: 23W/m・K, with a certain degree of thermal conductivity, it is able to transfer heat well during the sputtering process to ensure the uniformity of sputtering.
Theoretical density: 13.31g/cm³, the density is larger, which means that the mass of Hafnium metal sputtering target is larger under the same volume, and it can provide more sputtering substance.
Coefficient of Thermal Expansion: 5.9×10-⁶/K, the coefficient of thermal expansion is relatively small, which means that the dimensional change is small when the temperature changes, which is conducive to ensuring the accuracy of the sputtering coating.
DC sputtering maximum power density: usually 50W / square inch, which determines the maximum power that the target material can withstand during the DC sputtering process, and has an important impact on the sputtering rate and film quality.
Applications
Semiconductor manufacturing:
High-k dielectrics: In advanced semiconductor devices, high-k dielectrics are widely used. High-k dielectrics can increase gate capacitance and reduce gate leakage current, thus improving the performance and stability of transistors, and are of great significance in promoting semiconductor technology towards smaller size and higher performance. Hafnium-based high-k dielectric materials, for example, are a key component in semiconductor chip fabrication at 7 nm and below.
Barrier layer materials: can be used as a barrier layer between metal interconnect layers to prevent diffusion between different metal layers. As the integration of semiconductor chips continues to increase, the density and complexity of the metal interconnect layers are also increasing, requiring higher and higher performance for barrier layer materials, and hafnium metal sputtering targets are able to meet this stringent requirement.
Optical field:
Optical Coating: used to prepare optical films, such as anti-reflective films, transparency enhancement films. These films can be applied to optical devices such as optical lenses, camera lenses, laser devices, etc. to improve the performance and service life of optical devices. The special optical properties of hafnium metal enable it to play a unique role in optical coatings, such as increasing the hardness, abrasion resistance and optical stability of films.
Photovoltaic cells: Hafnium metal sputtering targets can be used in the manufacture of photovoltaic cells to prepare the relevant functional thin films and improve the photovoltaic cell’s photovoltaic conversion efficiency and stability.
Aerospace: Hafnium metal has a high melting point, high strength and good corrosion resistance, its sputtering target preparation of thin films can be used in the aerospace field of key parts coating. For example, hafnium-based thin films coated on the surface of engine blades, turbine discs and other high-temperature components can improve the high-temperature resistance, oxidation resistance and corrosion resistance of the components, thereby extending the service life of the components and improving the reliability and performance of the aero-engine.
Surface coating field: it can be used to prepare surface coatings for various tools and mechanical parts to improve their hardness, wear resistance and corrosion resistance. For example, hafnium-based thin films coated on the surface of tools, moulds, bearings and other parts can significantly improve their service life and performance, and reduce production costs and maintenance costs.
Scientific research: In the field of materials science, physics and other scientific research, hafnium metal sputtering targets are commonly used to prepare a variety of experimental samples and research materials. For example, they are used in basic scientific research to study the structure, properties and phase transitions of materials, as well as in applied research to develop new materials and functional devices.
VI HALBLEITERMATERIAL GmbH (VIMATERIAL) employs a stringent quality assurance system to ensure the reliability of our product quality. Strict quality control is implemented throughout the entire production chain, and for defective products, we strictly enforce the principle of rework and redo. Each batch is released only after passing detailed specification tests.
Every batch of our materials is independently tested, and, if necessary, we send samples to certified companies for testing. We provide these documents and analysis certificates with the shipment to certify that our products meet the required standards.
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