Catalogries

Chemical Name:
Hafnium Fluoride
Formula:
HfF4
Product No.:
720900
CAS No.:
13709-52-9
EINECS No.:
237-258-0
Form:
Powder
HazMat:
Class 6.1 (8) / UN3290 / PG II

MSDS

TDS

Product ID Formula Purity Dimension Quantity Price in € Inquiry
720900PD001 HfF4 99.9% (Zr< 0.5wt%) -60 Mesh 5g 108.00 Inquire
Product ID
720900PD001
Formula
HfF4
Purity
99.9% (Zr< 0.5wt%)
Dimension
-60 Mesh
Quantity
5g
Price in €
108.00

Hafnium Fluoride powder is a white, water-insoluble powder that is chemically relatively stable and is prepared mainly by the reaction of hafnium oxides with hydrofluoric acid. It has important applications in the fields of optical coatings and materials science but should be handled with care and protection as it is irritating to the human respiratory system, skin and eyes.

Properties

Molecular formula: F₄Hf

Molecular weight: 254.48

CAS No.: 13709-52-9

Appearance: White crystalline solid powder

Melting point: about 310°C (sublimation)

Boiling point: 970°C

Density: 7.1g/cm³

Solubility: Difficult to dissolve in water

Applications

Optical field:

Optical coatings: due to its high refractive index and low dispersion, hafnium fluoride is often used as an optical coating material for the production of anti-reflective coatings as well as other optical components. Applications in the ultraviolet (UV) range are particularly effective, improving the performance and lifetime of optical components.

Optical fibre doping: Used as a dopant in the manufacture of optical fibres, it increases the refractive index of glass, thus improving the performance of optical fibres in telecommunication applications, e.g. increasing the speed and quality of signal transmission.

Semiconductor Manufacturing:

Etching: Hafnium fluoride powder is used in plasma etching processes during semiconductor manufacturing. It can be used as an etchant to accurately etch a variety of materials, helping to carve precise circuit patterns on semiconductor surfaces, which is important for the manufacture of microelectronic devices such as integrated circuits.

Cleaning: It can be used in the cleaning process of silicon wafers to remove impurities and contaminants from the wafer surface to ensure the quality and performance of semiconductor devices.

Nuclear reactor field: Hafnium has excellent neutron absorption ability, so hafnium fluoride can be used as a control material in nuclear reactors to regulate the nuclear fission reaction and maintain the stability of nuclear reactors.

Aerospace field:

High-temperature ceramic composites: used to produce high-temperature ceramic composites required in the aerospace field, which are capable of withstanding extreme high-temperature environments, such as the combustion chambers of rocket engines, nozzles and other components.

Thermal protective coatings: can be used as thermal protective coatings on aerospace components to protect them from damage in high temperature environments, increasing the reliability and service life of the components.

Catalysts: Hafnium fluoride is Lewis acidic and can be used as a catalyst in a variety of chemical reactions, playing a role in organic synthesis and other catalytic processes.

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QUALITY ASSURANCE

VI HALBLEITERMATERIAL GmbH (VIMATERIAL) employs a stringent quality assurance system to ensure the reliability of our product quality. Strict quality control is implemented throughout the entire production chain, and for defective products, we strictly enforce the principle of rework and redo. Each batch is released only after passing detailed specification tests.

Every batch of our materials is independently tested, and, if necessary, we send samples to certified companies for testing. We provide these documents and analysis certificates with the shipment to certify that our products meet the required standards.

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