Hafnium Carbide

Hafnium Carbide sputtering target is a kind of material used in physical vapour deposition (PVD) technology with hafnium carbide as the main component, usually in the form of a plate or disc, with high purity, high density, good thermal and chemical stability, etc. It is a key material for the preparation of high-performance hafnium carbide thin films, which are widely used in the fields of electronics, optics, aerospace and so on.

Characteristics

Chemical formula: chemical formula HfC, composed of hafnium and carbon elements.

Purity: Purity requirements are usually high, generally 99.5% and above. High purity ensures the quality and performance of sputtered films and reduces the impact of impurities on film properties.

Crystal structure: Has a cubic (rock salt) crystal structure. This crystal structure makes hafnium carbide sputtering targets highly stable and homogeneous, which is conducive to uniform sputtering of atoms and uniform deposition of thin films during the sputtering process.

Melting point: very high melting point of about 3890°C. The high melting point allows it to maintain a stable structure and properties at high temperatures, making it suitable for applications requiring a high-temperature sputtering process and able to withstand the energy shocks and high temperatures of the sputtering process.

Theoretical density: approx. 12.2g/cm³. The higher density enables the sputtering target to have higher quality and stability, which helps to improve the efficiency of the sputtering process and the quality of the film.

Sputtering RF type: Suitable for RF sputtering. During the RF sputtering process, the hafnium carbide sputtering target can be effectively bombarded by ions so that the atoms on its surface are sputtered out and deposited on the substrate to form a thin film.

Applications

Semiconductor field:

Integrated circuit manufacturing: In the semiconductor chip manufacturing process, hafnium carbide sputtering targets can be used to prepare thin films with high dielectric constants, as capacitive dielectric layers or gate insulating layers, etc., which can improve the integration and performance of integrated circuits. For example, as semiconductor technology continues to smaller size, higher performance development, the dielectric properties of the material requirements are becoming higher and higher, hafnium carbide thin film because of its excellent dielectric properties can meet this demand.

Semiconductor packaging: used in the semiconductor packaging process metallisation layer coating, such as in the chip’s lead frame, pads and other parts of the hafnium carbide thin film coating, can improve the reliability of the package and conductivity, while enhancing the protection of the chip.

Aerospace:

Coating of high-temperature parts: aerospace equipment faces extreme environments such as high temperatures and high pressures during operation, and the high melting point and high-temperature resistance of hafnium carbide materials make them ideal for coating high-temperature parts. For example, a hafnium carbide film coated on the surface of turbine blades, combustion chambers, and other key components of an aero-engine can improve the component’s high-temperature resistance and corrosion resistance, extending its service life.

Thermal protection system: spacecraft will be subject to high-temperature airflow when entering the atmosphere, and need to have a good thermal protection system. Hafnium carbide sputtering targets can be used to prepare thermal protection coatings to help spacecraft resist the erosion of high temperatures and ensure their safe return.

Optical field:

Optical films: can be used to prepare optical films, such as anti-reflective film, transparency enhancement film. Hafnium carbide film has good optical properties and stability, can improve the transmittance and reflectivity of optical devices, widely used in optical lenses, lasers, solar cells and other optical devices. For example, in the solar cell surface coated with hafnium carbide film can improve the photoelectric conversion efficiency of solar cells.

Display devices: in flat panel displays, liquid crystal displays and other display devices, hafnium carbide sputtering targets can be used to prepare electrode materials or functional films to improve the performance and stability of display devices.

Tool coating field: Hafnium carbide thin film coated on the surface of the tool can improve the hardness, wear resistance and cutting performance of the tool, and extend the service life of the tool. For example, after coating on the surface of high-speed steel tools, carbide tools, etc., it can be used to process high hardness materials or complex shapes of parts to improve machining efficiency and machining quality.

Other fields:
Energy field: in fuel cells, energy storage batteries and other energy devices, hafnium carbide sputtering targets can be used to prepare electrode materials or electrolyte film to improve the performance and stability of energy devices.

Biomedical field: hafnium carbide materials have good biocompatibility and corrosion resistance, can be used to prepare biomedical implants or coatings for medical devices, such as artificial joints, dental implants, etc., to improve the biocompatibility of implants and wear resistance.