Catalogries

Chemical Name:
Germanium Sulfide
Formula:
GeS
Product No.:
321600
CAS No.:
12025-32-0
EINECS No.:
234-704-6
Form:
Sputtering Target
HazMat:

MSDS

TDS

Product ID Formula Purity Dimension Quantity Price in € Inquiry
321600ST001 GeS 99.999% Ø 50.8 mm x 3.175 mm 1 462.00 Inquire
321600ST002 GeS 99.999% Ø 76.2 mm x 6.35 mm 1 POR Inquire
321600ST003 GeS 99.999% Ø 101.6 mm x 6.35 mm 1 POR Inquire
Product ID
321600ST001
Formula
GeS
Purity
99.999%
Dimension
Ø 50.8 mm x 3.175 mm
Quantity
1
Price in €
462.00
Product ID
321600ST002
Formula
GeS
Purity
99.999%
Dimension
Ø 76.2 mm x 6.35 mm
Quantity
1
Price in €
POR
Product ID
321600ST003
Formula
GeS
Purity
99.999%
Dimension
Ø 101.6 mm x 6.35 mm
Quantity
1
Price in €
POR

GeS target is an important material used in thin film deposition and other processes.

 

Basic information:

 

Chemical composition: Mainly composed of germanium (Ge) and sulfur (S) two elements.

 

Appearance Characteristics: Usually solid round or square flakes, color may vary depending on purity and specific composition, for example, may appear gray, black, etc.

 

Melting point: Having a high melting point

 

Crystal structure: Has a specific crystal structure, which determines its physical and chemical properties, and has an important impact on the growth and performance of the film during sputtering.

 

Stability: Relatively stable at room temperature, but chemical reactions may occur in high temperature, humid air or specific chemical environments. For example, it may be oxidized when heated in air.

 

Reactivity: It can react with some strong oxidants, reducing agents or specific chemical substances, but its chemical properties are relatively stable, and it is not easy to react violently with common chemical substances.

 

Preparation method:

 

Powder metallurgy method: the high purity germanium powder and sulfur powder in accordance with a certain proportion of mixing, grinding, pressing and other processes to make billets, and then sintering under high temperature and high pressure conditions to obtain sulfide germanium target. This method can prepare the target material with uniform composition and high density.

 

Chemical vapor deposition method: using germanium compounds and sulfur compounds as precursors, under certain temperature and atmosphere conditions, through chemical vapor deposition method to grow on the substrate of germanium sulfide film, and then the film is peeled off from the substrate to make germanium sulfide target material.

 

Application field:

 

Semiconductor industry: In the manufacturing of semiconductor devices, GeS targets can be used to prepare thin films, these films can be used as the functional layer of semiconductor devices, such as solar cells, photodetectors and other devices, GeS films can play a role in absorbing light, converting energy and so on.

 

Optical field: Because germanium sulfide has certain optical properties, it can be used to prepare optical films, such as in infrared optical devices, germanium sulfide films can be used as anti-reflection films, reflective films, etc., to improve the performance of optical devices.

 

Materials science research: As a new type of material, germanium sulfide target is also receiving attention in materials science research, and researchers use it to explore the physical and chemical properties of new materials, as well as develop new application areas.

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QUALITY ASSURANCE

VI HALBLEITERMATERIAL GmbH (VIMATERIAL) employs a stringent quality assurance system to ensure the reliability of our product quality. Strict quality control is implemented throughout the entire production chain, and for defective products, we strictly enforce the principle of rework and redo. Each batch is released only after passing detailed specification tests.

Every batch of our materials is independently tested, and, if necessary, we send samples to certified companies for testing. We provide these documents and analysis certificates with the shipment to certify that our products meet the required standards.

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