Germanium Selenide

Germanium Selenide sputtering target is a black solid sputtering material with high purity, good thermal stability and unique electrical properties, which can be used in semiconductor manufacturing, optoelectronic devices and other fields.

Properties

Chemical formula: GeSe

Appearance and morphology: Mostly black solid target material.

Density and melting point: Density is about 5.6g/cm³, melting point is 667°C.

High purity and low impurities: Strict manufacturing process ensures the high purity of Germanium Selenide sputtering targets and reduces the impurity content, which is essential to ensure the quality and performance of sputtered films, and helps to improve the electrical and optical properties of the films to meet the stringent requirements of material purity for high-end applications.

Good thermal stability: In the process of film deposition, it can maintain the stability of the performance, ensure the smooth progress of the sputtering process and the consistency of the performance of the prepared film, which can be adapted to a variety of different sputtering process conditions and working environment.

Unique electrical properties: with a certain degree of electrical conductivity, its unique composition makes its electrical properties to meet the needs of different application scenarios, it is an ideal material for the preparation of semiconductor devices, electronic devices and other required films, can realize efficient charge transfer, which can help to improve the performance of the device and work efficiency.

Uniformity of microstructure: Germanium Selenide sputtering targets are carefully designed and manufactured to have a uniform microstructure, which is essential for accurate sputtering performance and ensures that sputtered atoms are uniformly deposited on the substrate, resulting in thin films of uniform thickness and stable properties.

Applications

Semiconductor manufacturing: Germanium Selenide sputtering targets are used to deposit high-quality thin films in the preparation of semiconductor devices, e.g., as active layers in semiconductor thin-film transistors (TFTs) or as electrodes, barrier layers, etc., in other semiconductor devices, which contributes to improving the performance and reliability of semiconductor devices.

Optoelectronic devices: Due to its special physical and chemical properties, Germanium Selenide sputtering target also has important applications in the manufacture of optoelectronic devices, such as the preparation of photodetectors, light-emitting diodes (LEDs) and other devices in the function of the thin film, which can realize the efficient absorption, emission or detection of light.

Other fields: can also be used in other aspects of the electronics and information industry, such as integrated circuits, information storage, etc.; in the field of glass coating, can be used for the preparation of coated glass with special properties; in addition, in the wear-resistant materials, high-temperature corrosion-resistant, high-grade decorative products and other industries also have a certain degree of application prospects.