Gallium Telluride sputtering targets are sputtering targets made of Gallium Telluride (Ga₂Te₃) as the main component. Based on Ga₂Te₃’s unique chemical composition and excellent physical properties, they are mainly used in the preparation of high-performance optoelectronic devices, semiconductor thin films and so on.
VIMATERIAL supplies Gallium Telluride sputtering targets with high purity, low impurities, uniform composition, stable performance, etc. And we have professional target binding service to provide one-stop solution for customers. We focus on cutting-edge chemical material innovation, support product customization and development, please contact us.
Molecular formula: Ga₂Te₃
Molecular weight: about 639.36
Appearance: dark gray to black metallic luster
Density: about 6.0 g/cm³.
Melting point: approx. 625°C
Crystal structure: Belonging to the hexagonal crystal system, this unique crystal structure gives Ga₂Te₃ sputtering targets special electrical, optical and thermal properties.
Semiconductor industry: Gallium Telluride sputtering targets play a key role in semiconductor chip manufacturing. Through physical vapor deposition, high-quality Ga₂Te₃ films can be prepared on chip substrates, and these films can be used to manufacture high-speed transistors, integrated circuits, and other key components.
Optoelectronic device field: In the preparation of infrared detectors, Gallium Telluride sputtering target has an important application value. Utilizing its good absorption and response properties to infrared light, it can prepare a highly sensitive infrared detection film, significantly improving the detection range and sensitivity of the detector.
Optical Coating: Gallium Telluride sputtering targets can be used to prepare thin films with special optical properties in the coating process of optical lenses, glasses and other components. Through precise control of the sputtering process parameters, a variety of optical films such as transmittance enhancement films, reflective films, filter films, etc. can be prepared, effectively improving the transmittance, anti-reflective properties and spectral selectivity of optical components.
We have set up a strict quality control system, from raw material purchasing to every step of product production, we carry out strict quality control. During the production process, the products are subjected to several comprehensive inspections and tests, including purity test, density test, crystal structure analysis, composition uniformity test, surface flatness test and sputtering performance test. Test records are kept for all products with a high degree of traceability, ensuring that each product meets ASTM and industry-specific standards. Moreover, third-party inspections are available upon request to give customers peace of mind.
Gallium Telluride sputtering targets are packed in boxes after double vacuum bagging, and the boxes are placed in customized cartons for reinforced packaging to ensure the safety of long-distance transportation.
Gallium Telluride sputtering targets should be stored in a dry, well-ventilated environment at a suitable temperature. Avoid placing them in a humid, high-temperature or corrosive gas environment, and protect them from mechanical impact.
VI HALBLEITERMATERIAL GmbH (VIMATERIAL) employs a stringent quality assurance system to ensure the reliability of our product quality. Strict quality control is implemented throughout the entire production chain, and for defective products, we strictly enforce the principle of rework and redo. Each batch is released only after passing detailed specification tests.
Every batch of our materials is independently tested, and, if necessary, we send samples to certified companies for testing. We provide these documents and analysis certificates with the shipment to certify that our products meet the required standards.
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